JTEC Corporation

CA-1000 is Catalyst-Referred Etching-based nanofabrication and finishing technology that has high potential and applicability to semiconductor material polishing.

CA-1000 is equipped with a catalyst pad as a reference surface. Unlike CMP, CA-1000 only uses water as an etchant which is compatible with clean-room environment. 

During the planarization, the selective etching is promoted at the topmost areas in contact with the catalyst surface. Thanks to selective chemical etching, CA-1000 could effectively improve surface roughness to sub-Anstrom Ra without changing the thickness uniformity of various functional materials, such as quartz, silica glass, Si, LN, LT, and sapphire.

CA-1000 是基於催化劑遞延蝕刻技術的納米製造和精加工技術，在半導體材料拋光方面具有很高的潛力和適用性。

CA-1000 配備了一個催化劑墊作為參考表面。與 CMP 不同，CA-1000 只使用水作為蝕刻劑，與無塵室環境兼容。

在平面化過程中，選擇性蝕刻在與催化劑表面接觸的最頂端區域進行。由於採用了選擇性化學蝕刻技術，CA-1000 可以有效地將石英、矽玻璃、矽、LN、LT 和藍寶石等各種功能材料的表面粗糙度提高到sub-Anstrom Ra，而不會改變其厚度均勻性。

JC-1000 is a numerically controlled plasma chemical vaporization machining system that is a highly efficient and damage-free polishing method.

JC-1000 is equipped with shape measurement equipment and plasma processing equipment. The plasma processing equipment is equipped with a nozzle working under several kPa to atmospheric pressure conditions. 

JC-1000 could effectively improve thickness uniformity and shape without changing the surface roughness.

JC-1000 是一種數控等離子化學氣化加工系統，是一種高效、無損傷的拋光方法。

JC-1000 配備了形狀測量設備和等離子加工設備。等離子加工設備配備了可在幾kPa至大氣壓條件下工作的噴嘴。

JC-1000 可以在不改變表面粗糙度的情況下有效改善厚度均勻性和形狀。

Plasma-assisted polishing is a unique surface polishing technology for single crystal diamond, SiC, GaN and other hard materials.

PA-1000 is equipped with a quartz substrate as a reference surface where the plasma is generated on its surface. The chemical etching at the topmost area is promoted by radicals at the contact point between the reference surface and the work surface. Thanks to the selective etching phenomena, the work surface is efficiently planarized at the atomic level.

等離子體輔助拋光是一種獨特的表面拋光技術，適用於單晶金剛石、SiC、GaN 和其他硬度材料。

PA-1000 配備一個石英基板作為基準面，等離子體在其表面產生。標準面和被加工物表面接觸點上的自由基促進了最頂端區域的化學蝕刻。由於選擇性蝕刻現象，被加工物表面在原子層面上被有效地平面化。

The high-precision lenses play an important role in optical devices. With the state-of-the-art manufacturing of JTEC, high-precision lenses with a surface shape accuracy of less than lambda/20 could be manufactured and delivered quickly. 

Our lenses are at low surface shape accuracy, low surface roughness, scratch-dig, and thickness tolerance.

JTEC could assist you with the best quality lens, affordable price, and fast delivery.