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Pivotal Systems

Fremont,  CA 
United States
http://www.pivotalsys.com
  • Booth: J3034

Welcome to Pivotal Systems' Booth!

Overview

Pivotal Systems provides the best-in-class technology for gas flow monitoring and control for the global semiconductor industry. The company’s proprietary hardware and software utilizes advanced machine learning to enable preventative diagnostic capability, resulting in an order of magnitude increase in fab productivity and capital efficiency for existing and future technology nodes.

The platform includes Pivotal’s Gas Flow Controller (GFC) product lines that offer high-accuracy, real-time monitoring, and control of the most critical parameters that are difficult to control in wafer processing today: Gas Flow and Chamber Condition.  Our product portfolio includes Flow Ratio Controllers (FRC), Positional Mass Flow Controllers (PFC), Pressure Controllers, Ultra High-Speed Valves, and thermal Mass Flow Controllers. 

Our Gas Flow Controllers (GFCs) and Flow Ratio Controllers (FRCs) meet our customers’ flow needs across industries and applications where precise, accurate, and controlled flow is required.  Our GFC line uses machine learning to provide maintenance and calibration free mass flow controllers during the devices' lifetime enabling fab productivity and environmental gas savings. 


  Press Releases

  • Introducing the GFC X and Flow Ratio Controller, setting new benchmarks in semiconductor manufacturing efficiency and precision.

    Fremont, California — August 30, 2024 — Pivotal Systems Corporation, a leading provider of innovative gas flow control (GFC) solutions to the semiconductor industry, is set to unveil two innovative products — the GFC X and the Flow Ratio Controller (FRC) — at the upcoming SEMICON Taiwan 2024, September 4-6. These new products represent a significant step forward in semiconductor manufacturing, offering unmatched precision, speed, and reliability.

    The GFC X, the latest generation in Pivotal's high-flow product line, features a pressure-based flow controller with a position control valve. This innovation allows for precise control, offering one of the industry's widest ranges of accuracy, making it ideal for various applications, including deposition processes.

    The GFC X paves the way for the future of gas flow control by offering an order of magnitude improvement on key flow metrics and enabling advanced wafer-manufacturing processes. In addition, the GFC X offers a range of accuracy from 5% to 100% of full scale, surpassing many competitors.

    “Our customers can rely on precise accuracy without the need for frequent calibrations,” said Joseph Monkowski, President and CTO of Pivotal Systems. “These innovations significantly boost fab productivity and capital efficiency, leveraging our cutting-edge solutions.”

    The FRC, first introduced during Semicon West in July, is designed to meet the industry's growing demand for faster and more responsive flow control. The FRC uses Pivotal’s proprietary control valve to improve wafer uniformity and wafer-to-wafer uniformity. It’s the industry’s fastest flow ratio controller, with a sub-second response time, enabling rapid adjustments to changing conditions, particularly in high-bandwidth memory and AI applications.

    Both products exemplify Pivotal's commitment to delivering superior performance, featuring zero drift, best-in-class accuracy, and real-time data availability. Pivotal’s competitive advantage lies in its drift-free performance, offering  ±0.5% of set point and repeatability of  ±0.2% of set point.

    Designed to minimize downtime and reduce the need for recalibration, the GFC X and FRC provide consistent, reliable results, significantly lowering the total cost of ownership for semiconductor manufacturers.

    Pivotal's products are already making waves among major industry players, who appreciate the unparalleled reliability and accuracy these solutions offer. While Pivotal cannot disclose customer names, the benefits of the GFC X and FRC are resonating strongly with the market.

    “Pivotal Systems has a long history of innovation in semiconductor manufacturing, consistently pushing the boundaries of what’s possible in flow control technology,” said Jan-Yu Weng, CEO of Pivotal Systems. “The launch of the GFC X and FRC at Semiconductor Taiwan is a testament to the company’s ongoing commitment to excellence.”

    Visit Pivotal Systems at Booth J3034 at SEMICON Taiwan 2024 to see the GFC X and FRC and learn more about how these groundbreaking products can enhance your semiconductor manufacturing processes.

    About Pivotal Systems

    Pivotal Systems provides the best-in-class gas flow monitoring and control technology platform for the global semiconductor industry, as well as other industries requiring high performance, high reliability gas flow solutions. The Company’s proprietary hardware and software utilizes advanced machine learning to enable preventative diagnostic capability resulting in significant increases in productivity and capital efficiency. For more information on Pivotal Systems Corp, visit www.pivotalsys.com.

    Press contact

    Michelle Adelson

    [email protected]

    1-310-500-7422


  Products

  • FLOW RATIO CONTROLLER (FRC)
    Pivotal System's latest product is the Flow Ratio Controller (FRC) that uses Pivotal’s proprietary control valve to improve wafer uniformity and wafer to wafer uniformity....

  • Pivotal System's Flow Ratio Controller is the fastes in the industry, exceeding a <1 sec. settling time requirement! ​ The FRC is available in 3 and 4 channel configurations with ECAT communication.  Come by our booth to learn more.
  • GAS FLOW CONTROLLER S SERIES (GFC-S)
    Pivotal Systems’ GFC-S paves the way for the future of gas flow control, enabling flows from 0.25 sccm to 2000 sccm....

  • The GFC-S combines Pivotal's patented, high accuracy GFM™ system with its patented control valve technology making the GFC-S the fastest, most accurate, most reliable mass flow controller on the market.  The GFC-S is also calibration and maintenance free, increasing your fab productivity, gas savings, and reducing environmental impact!

    As process geometries within the semiconductor industry continue to shrink to 3nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.

    Pivotal Systems’ GFC-S paves the way for the future of gas flow control. The GFC combines Pivotal's patented, high accuracy GFM™ system with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes. 

    Feature Description:

    Wide Flow Range:Full Scale 0.5−100%

    Best Flow Accuracy: ±0.5% of Setpoint for 0.5−100% Full Scale

    Fastest Settling Time for Turn-On and Turndown:  ≦ 100ms:10% -100% Full Scale; ≦ 300ms:0.5% -10% Full Scale 

    Effect of Pressure and Temperature: Invariant

    Automated In Situ Calibration: NIST Traceable

    Innovative Control Technology:Robust Design, No Orifice

  • GAS FLOW CONTROLLER X SERIES (GFC-X)
    Pivotal Systems’ GFC-X paves the way for the future of gas flow control, enabling flows up to 50 SLM. The GFC-X is Pivotal's new high flow enabling GFC that combines a differential pressure sensor with Pivotal's patented control valve technology....

  • As process geometries within the semiconductor industry continue to shrink to 3 nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs Introduction are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.

    Pivotal Systems’  GFC-X paves the way for the future of gas flow control. The GFC-X combines a differential pressure with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes. 

    Feature Description:

    Wide Flow Range:Full Scale 2.0−100%

    Flow Accuracy:±1.0% of Setpoint for 10% -100% Full Scale; ±0.25% of full scale for 2.0−10.0%  Full Scale 

    Fastest Settling Time for Turn-On and Turndown:  ≤300ms 10%-100% F.S. 

    Innovative Control Technology:Robust Design, No Orifice

  • GAS FLOW CONTROLLER T SERIES (GFC-T)
    The GFC-T is Pivotal Systems new thermal series...

  • The GFC-T is Pivotal Systems new thermal series