Hologenix Magic Mirror™ Defect Detection System
Defect Detection on Ultra-Flat Wafers (Magic Mirror™) Full Wafer Submicron Defect Detection Systems. The concept is a powerful topographic tool for the characterization of the morphology of glass and mirror-like surfaces, such as semiconductor wafers. The sensitivity of the method is a 0.4 μm height difference over a 10 mm distance and 50 nm over a 0.5 mm distance. Makyoh topography has proven its power, for example in detecting flaws induced by wafer slicing, polishing, lapping, and defects in directly bonded Si wafers.
New Capabilities
。High Resolution Camera and Optical Components – 5 MegaPixel Camera
。IR (Infrared) Camera and Optics
。Long Focal Length Version – Greater Detection Capability for Shallow Defects
。Computer Controlled Optical Settings
。Latest Automation Capabilities – Edge handling, Wafer Sorting
Optical Technique
。Halogen Lamp with Band-Pass Filter
。Series of Lenses Create Broad Beam Collimated Light Column
。Parallel Rays of Light Reflect Perpendicular to the Polished Surface – Min. 3% reflectivity required
。Reflected Rays Projected onto De-focused CCD Detector.
Software and Computer Control of Optics
Optics are controlled via a Software Interface:
。Brightness
。Sensitivity
Settings can be stored in a recipe and easily recalled
No operator involvement needed.