Nanoscribe GmbH & Co. KG

The Quantum X align is the high-precision 3D optics printer. It utilizes Aligned 2-Photon Lithography (A2PL) to fabricate microoptical components directly on photonic chips and optical fiber facets with sub-micron alignment accuracy. With automated substrate tilt correction and fiducial-based alignment, the system enables the production of low-loss optical couplers, beam-shaping structures, and other critical microoptics that are precisely aligned to chip waveguides or fiber cores. This capability streamlines coupling strategies, accelerates device development, and supports scalable integration in photonics packaging.

Key Features:

• High-performance 3D microfabrication with automatic high-precision alignment
• Precisely aligned printing on the facets of optical fibers and photonic chips
• Automatic detection and compensation of substrate tilt in 3 rotation axes

Nanoscribe Quantum X litho is the world’s first Two-Photon Grayscale Lithography (2GL^®) system and advances maskless microfabrication of microoptics and functional surfaces. Nanoscribe's Two-Photon Grayscale Lithography combines Two-Photon Polymerization (2PP) with the qualities of grayscale lithography to enable fast, precise fabrication of ultra-smooth surfaces and structures with excellent shape accuracy. Thus, Nanoscribe Quantum X litho redefines the fabrication of topographies with optical-quality surfaces, for freeform microoptics, microlens arrays and multi-level diffractive optical elements (DOEs). 2D and 2.5D optical elements like Fresnel lenses or hybrid microoptics, which are a mixture of refractive and diffractive elements, can be fabricated in a single step.

Key features:

• High-speed 2.5D microfabrication
• Ultra-smooth surfaces and excellent shape accuracy
• Design freedom with submicron resolution
• Automated processes, e.g., calibration, job execution and monitoring

Nanoscribe Quantum X shape is the high-resolution 3D printer for rapid prototyping and wafer-scale batch processing in research and industry. Based on Two-Photon Polymerization (2PP), the laser lithography system combines proprietary printing technologies that make it the optimal tool for microfabrication of virtually any 2.5D and 3D shape with submicron precision on areas up to 25 cm². The microfabrication system offers highest precision from nano- to macroscale printing.

Key Features:

• High-speed 3D microfabrication with ultra-fast voxel modulation rate and 100 nm feature size control
• Broad range of substrates and wafers up to 8”
• Industrial batch processing: 200 typical mesoscale structures printable overnight
• Touchscreen and remote control ensure high usability