TOKYO AIRCRAFT INSTRUMENT CO.,LTD.

Machida,  Tokyo 
Japan
https://www.tkk-air.co.jp
  • Booth: T9108

We are Advanced Packaging Automation Partner. Visit us!


  Products

  • Overlay Metrology System MAC-R
    MAC-R is the go-to overlay metrology system for production of power devices and legacy semiconductors.
    It provides excellent performance for a low price compared with similar systems....

  • Advantage1     Cost performance

    Low price & low running cost
    We create sufficient specifications by perfecting our target product, resulting in prices lowered by half in comparison to our old model.
    MAC-R has few consumption parts, allowing low expenses for maintenance and can largely compress running costs.

    Advantage2     Space-saving

    Minimum footprint: W 1300 mm x D 1300 mm
    Space-saving design of around four pieces of grating floorboards.
    Its small footprint allows greater flexibility in designing new production lines.
    MAC-R can also replace its old models in existing lines without the need to relocate other equipment, since its size is kept unchanged from the predecessors.

    Advantage3     Various wafers

    It accommodates wafers in a variety of sizes (including small diameters) and materials (SiC, GaN, sapphire etc.)
    Wafer specifications can be changed after delivery.

    Wafer sizes 3-inch, 4-inch, 5-inch, 6-inch, 8-inch
    (Wafer size differences up to 2 inches can be handled by one unit.)
    Wafer materials Si, SiC, GaN, GaAs, quartz, sapphire
    Measurement repeatability (3σ) ≤ 3.0 nm
    TIS (average) ≤ ±3.0 nm
    Throughput 100 wafers/h or more
    (in case of consecutively measuring 5 points in a wafer)
    Dimensions      1300 mm (W) x 1300 mm (D) x 1460 mm (H)
    Weight 800 kg
  • EUV Mask and Reticle transfer System
    “Enhancing yield and reliability through advanced handling, inspection, and automation of EUV masks and reticles.”...

  • Our equipment lineup supports mask manufacturers, and device manufacturers by automating key processes including transfer, inspection, and particle removal.

    By combining advanced handling mechanisms with optical inspection and ID tracking technologies, our solutions contribute to:

    • Stable and damage-free transportation
    • Improved yield through contamination control
    • Reduced labor and operational errors
    • Enhanced traceability and production management
  • Coming Soon 14-inch Photomask Transfer Platform
    Leveraging decades of experience in reticle handling and inspection systems, TKK is now developing a next-generation 14-inch photomask transfer platform to support the rapidly growing advanced packaging market....

  • TKK Vision for Advanced Packaging

    Current Solutions

    • Reticle Handling
    • Inspection Systems
    • Reticle Cleaning

    Next Step

    • 14-inch Photomask Automation Platform

    Future Goal

    • Smart Mask Logistics for Advanced Packaging Factories


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