Hydrogen-Fueled Abatement for High-Volume EPI and MOCVD GaN
Overview
Established in 1993 and headquartered in Colorado, USA, HIGHVAC engineers, develops, and manufactures point-of-use abatement systems for semiconductor processes. The company creates process-driven technology based on the specific chemistries and environmental requirements of each application. Through its hydrogen-fueled abatement systems, HIGHVAC’s EcoGuard has established a specialized position in Epitaxial and MOCVD GaN applications.
At SEMICON Taiwan 2026, HIGHVAC is highlighting the EcoGuard Series E and Series G—compact, single-enclosure Wet/Burn/Wet systems that use hydrogen as the combustion fuel. This industry-first platform delivers a highly stable flame profile that eliminates the flameout issues common in methane-fueled competitive systems. Together, the hydrogen-fueled burner and patented wet inlet enable the EcoGuard to handle high flows of silicon precursors including trichlorosilane without clogging, while managing hydrogen, ammonia, metal-organic compounds, corrosive byproducts, dopant gases, particulates, and reactive exhaust chemistry. The result is reduced maintenance requirements, maximized uptime, and higher throughput by minimizing unexpected downtime in high-volume manufacturing environments.