Vacuum Engineering & Materials

390 Reed Street
Santa Clara,  CA  95050

United States
http://www.vem-co.com
  • Booth: 5781

VEM is a leading manufacturer of high-quality, thin film deposition materials used in the semiconductor, wireless, photonics, LED, data storage, aerospace & defense and life sciences markets.  Headquartered in Silicon Valley with 30 years of experience, VEM serves over 300 customers globally and has a track record for providing outstanding service and support.

From cutting edge R&D needs to large production requirements, VEM offers a full range of product and service solutions.  Our product portfolio, ranging from high-purity PVD sputtering targets to evaporation materials spans the periodic table and we have an experienced technical team developing innovative new products.  Our specialty materials include Au, Pt, Pd, Al, AlSiCu, AlCu, Cu, Ti, Ni, Ta, Nb, WSi, MoSi, NiPt, TiAl and WTi – in all shapes and sizes with purities to 99.9999%.  VEM also provides in-house target bonding, backing plates, crucible liners, precious metal reclamation, shield cleaning and additional value-added solutions. 

VEM is ISO 9001:2008 certified.


 Press Releases

  • Vacuum Engineering & Materials (VEM), a leading manufacturer of physical vapor deposition (PVD) sputtering targets and evaporation materials, has increased capacity of its ISO 9001:2008 certified facility in Santa Clara, California by 40%. As a direct result of growing customer demand for shield cleaning services, the expansion provides precision parts cleaning and surface treatment of PVD shield kits, as well as other process kit types, for manufacturers in the semiconductor, photonics, LED, data storage, aerospace & defense and life sciences industries. In addition to new, automated robotic controlled Twin Wire Arc Spray (TWAS) and Plasma Spray capability, the investment includes equipment for ultrasonic cleaning, cleanroom drying, bake out, new cleaning processes, and a cleanroom certified to Class 100.

    The Twin Wire Arc Spray is a leading-edge technology that increases mean wafer between clean (MWBC) by applying an enhanced, textured coating on critical chamber components. The textured coating provides increased surface area of the parts and allows more material to be deposited as well as better deposition adhesion for better particle control. The Plasma Spray system allows for the ability to coat chamber components with high purity ceramic films, such as Al2O3 and Y2O3 to extend part life and improve surface cleanliness of parts.

    "We’ve expanded our manufacturing capacity to better serve our customers and to provide them with one-stop solutions that will enable them to focus on their core businesses,” said Bob Kavanaugh, President of VEM. “We are pleased our expanded facility is up and running providing customers with fast turnaround and lower costs. VEM is committed to continuing investments in our state-of-the-art facilities, to further meet customer needs.”

    Vacuum Engineering & Materials has been recognized as a trusted manufacturer of high-quality PVD materials for over 30 years. Based on years of experience, VEM continues to innovate new products and services that provide our customers with the latest PVD solutions available today.


 Products

  • VEM Advanced Powder Metallurgy Targets
    VEM continues to innovate by having one of the largest, cutting-edge Vacuum Hot Presses in the industry, allowing customers to develop some of the most advanced powder metallurgy targets available in the market....

  • VEM's extensive manufacturing capabilities include:

    • 250 ton, 2000°C Vacuum Hot Press for targets ranging from 50mm - 450mm.
    • Powder Lab with multiple blending tools including an Eirich Blender for quick homogenous material blends.
    • Induction Melting Equipment, Process Logic Controlled, to ensure repeatable process.
    • Casting, Forging and Rolling capability.
    • High-purity Indium Bonding, Ultrasonic Testing, ICP Analysis and Laser Inscribing.

    Some of the target materials available for hot press are Al2O3, AZO, BST, CrB2+SiC+other materials, CrSi-SiC, ITO, LiCo2O3, MoSi, NbTa, NiCrSi, NiFe + other materials, Ru, SiAl, SiCr, Ta, TaSi, TiAl, WTi, and WSi.

  • VEM Ultra-Pure Gold (UP Au) Evaporation Materials
    VEM Ultra-Pure Gold (UP Au) Evaporation Materials improves yield and production uptime ...

  • VEM Ultra-Pure Au evaporation materials enable PVD users to:
    •    Minimize spitting by reducing carbon and other contaminants
    •    Improve yield
    •    Increase production uptime

    Gold defects are a common problem during metal deposition by evaporation. Small gold droplets, often referred to as spits, can be discharged from the molten source during the the evaporation process that solidify into particles on the wafer. If these particles land on a structure, it can result in a microelectronic short circuit and possibly result in loss of wafer lots.

    In response to customer needs,VEM has developed a proprietary, proven manufacturing process that eliminates more contaminants that cause spitting from gold material. Our proprietary process extracts more contaminants that cause spitting from the gold material. Often the contaminant is observed as a carbonaceous film that leads to spitting and particle generation. Using several unique post fabrication processes enables VEM to offer exceptionally pure sources that have minimal residue and surface contamination. Ease of use, minimal conditioning and the consistently stable evaporation process are the hallmark of VEM UP Au evaporation materials.

  • VEM Shield Cleaning Services
    VEM Shield Cleaning Services provide one-stop solutions that enable customers to focus on their core businesses, providing fast turnaround and lower costs....

  • VEM has increased capacity of its ISO 9001:2008 certified facility in Santa Clara, California by 40%. As a direct result of growing customer demand for shield cleaning services, the expansion provides precision parts cleaning and surface treatment of PVD shield kits, as well as other process kit types, for manufacturers in the semiconductor, photonics, LED, data storage, aerospace & defense and life sciences industries. In addition to new, automated robotic controlled Twin Wire Arc Spray (TWAS) and Plasma Spray capability, the investment includes equipment for ultrasonic cleaning, cleanroom drying, bake out, new cleaning processes, and a cleanroom certified to Class 100.

    The Twin Wire Arc Spray is a leading-edge technology that increases mean wafer between clean (MWBC) by applying an enhanced, textured coating on critical chamber components. The textured coating provides increased surface area of the parts and allows more material to be deposited as well as better deposition adhesion for better particle control. The Plasma Spray system allows for the ability to coat chamber components with high purity ceramic films, such as Al2O3 and Y2O3 to extend part life and improve surface cleanliness of parts.


 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
No
Product Demonstrations:
No

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