PORT WASHINGTON, NY, July 11, 2017 – Pall Corporation is pleased to introduce new filtration solutions for use in the semiconductor industry. Pall Corporation is a global leader in high-tech filtration, separation, and purification, serving the diverse needs of customers across the broad spectrum of life sciences and industry.
Two new products will be featured in the Pall booth at the SEMICON West show this week. The solutions are designed to improve filtration and reduce defectivity in a variety of semiconductor applications.
The New 1nm PE-Kleen Filter
The 1 nm PE-Kleen filter is designed for dispensing advanced patterning materials used in semiconductor lithography processes. The new filter rated at 1 nm is constructed of ultra-high purity, high density polyethylene materials. It offers a 20% reduction in mean pore size, while maintaining the pressure drop of Pall’s existing 2 nm product. This enables customers to move to tighter filtration without sacrificing pressure drop.
“Pall’s PE-Kleen lithography filters are known for superior defect reduction capability,” said Michael Mesawich, Vice President of Strategic Marketing. “The new 1nm PE-Kleen filter is a significant step in offering enhanced defectivity reduction.” The new 1 nm PE-Kleen adopts the Pall Xpress filter cleanliness option, designed for the most advanced patterning chemistries. With the Xpress filter option, the 1 nm PE-Kleen filter is one of the cleanest lithography filters available.
The New 2 nm Ultipleat® G2 SP DR Filter
The new 2 nm Ultipleat G2 SP DR filter is the latest addition to Pall’s successful Ultipleat SP DR chemical filter line-up and is a key component of Pall’s disposable PFA Kleen-Change assemblies. This filter is designed to meet the growing defectivity challenges of sub-10 nm critical aqueous chemical processing. It demonstrates finer retention, high flow, and higher purity than previous filters. Retention is validated using Pall’s gold nanoparticle challenge test.
“The new Ultipleat G2 SP DR filter leverages Pall’s proprietary highly asymmetric membrane filter structure that removes contaminants as small as 2 nm, yet still maintains very high flow due to the unique membrane structure,” said Tony Shucosky, Vice President of Marketing, Pall Microelectronics. “Pall is proud to bring these important retention and high flow capabilities to the market to enable the semiconductor scaling cadence.”
Pall’s completely integrated manufacturing capability extends from polyarylsulfone resin to the finished filter device. The company’s advanced manufacturing process uses clean room manufacturing and statistical process control to ensure the reliability and performance of every 2 nm Ultipleat G2 SP DR filter.
For more information on these new solutions, visit Pall Corporation at SEMICON West, Booth #7509 or visit the Pall event page at https://microelectronics.pall.com/en/events/semicon-west-2017.com.
About Pall Corporation
Pall Corporation is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The Company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation serves customers worldwide. For more information, visit www.pall.com.
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