Custom Plasma Etch (RIE) & Plasma Deposition (PECVD) Systems
Trion Technology designs, manufactures, markets and services versatile plasma equipment (ICP-RIE, PECVD, PVD, Ashers, and more) to enable our customers in the Semiconductor, MEMS, LED, RF Power, F.A., Opto-, III-V, Wafer Level Packaging, Thin Film Head, and Solar industries.
GaN Etch, GaAs Etch, SiO2 Etch, Si02 Deposition, Si3N4 Etch, Si3N4 Deposition, and more.
Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability. If you wish anything from full-blown production cluster tools to a simple laboratory system, Trion makes it.
Phone: +1 727 461 1888
New Exhibitor: No
New Products: No
Displaying Equipment: No
Product Demonstrations: No
Please indicate which industries/technologies your company serves LED/solid state lighting, MEMS, Other, Photovoltaic, Plastic/organic/flexible electronics, Power Semiconductors, Semiconductor, Flexible and Printed Electronics-, Sensors
If you checked Other, please indicate your Company Industry RF Power, Failure Analysis, Opto-, III-V, Wafer Level Packaging, Thin Film Head, Solar