Our patent-pending EtchDefender™ coating extends the life of quartz thermocouple sheaths in ASM® EPSILON® epitaxial reactors up to 3X longer and reduces your annual spend by over 30%.
This leading-edge technology was tested extensively both in a laboratory setting and in a production environment at a major wafer manufacturing facility. Using TCs coated with EtchDefender™ allows a tool to run continuously and reduces maintenance cycles, consistently resulting in:
- Increased process uptime
- Reduced process variation, so more wafers can be produced per tool with higher
- Reduced labor and increased safety
- Decreased risk of technicians igniting pyrophoric deposits as a result of reduced
- Decreased exposure of the chamber to oxygen, resulting in less time needed to purge the oxygen from all surfaces in SiGe applications
Click here to find out more about EtchDefender™ Technology.
ASM® and EPSILON® are registered trademarks of ASM® International. Neither Conax Technologies nor its products are affiliated with, approved by or sponsored by ASM® International.