July 12-14, 2016
San Fransisco, CA
EXPERTISE IN WET ETCHING & CLEANING EQUIPMENT
Global Zeus, established in 1970, has been growing alongside the semiconductor industry for more than 48 years. We provide wet etching and cleaning equipment and technologies. Our market-leading wet station and single spin processor are widely used for photoresist stripping, silicon nitride etching, metal etching, and wafer cleaning and contain higher throughput and reliability. Global ZEUS has semiconductor equipment manufacturing and R&D facilities both in Japan and South Korea. With over 100 R&D employees we are able to develop and deliver high quality products worldwide. Furthermore, we have branches in China and the US and can consistently support customers spanning over multiple continents in a timely manner.