JEOL USA, Inc.

11 Dearborn Rd
Peabody,  MA  01960-3823

United States
http://www.jeolusa.com
  • Booth: 6063

See the latest in SEM and TEM Imaging and Analysis

JEOL introduces a new high throughput Transmission Electron Microscope (TEM) for the demands of the semiconductor industry, and demonstrates the latest Scanning Electron Microscope (SEM) technology with streamlined operation and ZeroMag sample navigation.  Visit our booth #6063 in the North Hall to learn more about our SEM, TEM, FIB, cross section polisher, and e-beam lithography. 


 Press Releases

  • New High Throughput Analytical TEM

    A new high throughput analytical Transmission Electron Microscope (TEM) recently introduced by JEOL provides superb high stability and analytical capabilities with a renewed sophisticated exterior design.  Incorporating hardware technologies of JEOL’s widely-acclaimed atomic resolution Field Emission TEMs, the ACE200F is an all-new TEM designed for the semiconductor industry.  The ACE200F provides fast, stable, high resolution data acquisition for morphological observation, critical dimension measurement, and elemental analysis.  With pre-programmed recipes, the fully unattended operation of the microscope is ideal for fast-paced manufacturing requirements and data is produced automatically. Visit the JEOL booth #6063 N. Hall to learn more about the productivity achieved with this unique electron microscope.  http://bit.ly/2N1l0YX

  • New SEM Streamlines Workflow for Imaging and Analysis

    JEOL has increased throughput for imaging and analysis with its new JSM-IT200 Scanning Electron Microscope. New software streamlines workflow with seamless navigation from optical to SEM imaging. The IT200 delivers high resolution imaging with unsurpassed low kV performance, a high sensitivity solid state BSE detector (included with LV models), low vacuum SE detector (optional), and powerful software functionality, including automated image montaging, integrated management of image and analysis data, and automated report generation from all data ranging from collected SEM images to elemental analysis results. The analytical series of this SEM includes JEOL’s fully embedded EDS system which provides real time EDS spectra during image observation. See a demo of the JEOL IT200 SEM in the JEOL booth #6063 N. Hall.


 Products

  • Scanning Electron Microscope - IT200
    Streamline workflow for imaging and analysis with our smart-flexible-powerful SEM. ...

  • SEM Streamlines Workflow for Imaging and Analysis

    JEOL has increased throughput for imaging and analysis with its new JSM-IT200 Scanning Electron Microscope. New software streamlines workflow with seamless navigation from optical to SEM imaging. The IT200 delivers high resolution imaging with unsurpassed low kV performance, a high sensitivity solid state BSE detector (included with LV models), low vacuum SE detector (optional), and powerful software functionality, including automated image montaging, integrated management of image and analysis data, and automated report generation from all data ranging from collected SEM images to elemental analysis results. The analytical series of this SEM includes JEOL’s fully embedded EDS system which provides real time EDS spectra during image observation. See a demo of the JEOL IT200 SEM in the JEOL booth #6063 N. Hall.

  • ACE200F Transmission Electron Microscope
    JEOL's new high throughput TEM for semiconductor applications...

  • New High Throughput Analytical TEM

    A new high throughput analytical Transmission Electron Microscope (TEM) recently introduced by JEOL provides superb high stability and analytical capabilities with a renewed sophisticated exterior design.  Incorporating hardware technologies of JEOL’s widely-acclaimed atomic resolution Field Emission TEMs, the ACE200F is an all-new TEM designed for the semiconductor industry.  The ACE200F provides fast, stable, high resolution data acquisition for morphological observation, critical dimension measurement, and elemental analysis.  With pre-programmed recipes, the fully unattended operation of the microscope is ideal for fast-paced manufacturing requirements and data is produced automatically. Visit the JEOL booth #6063 N. Hall to learn more about the productivity achieved with this unique electron microscope. 

     

  • Direct Write E-beam Lithography
    With more than 50 years of e-beam expertise, JEOL has the support and technology to match today's demands for lithography tools. ...

  • JEOL JBX-8100FS series spot beam lithography system is designed for higher throughput and lower operating costs.The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process.  http://bit.ly/2BMAAAq

 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
Yes
Product Demonstrations:
Yes
Please indicate which industries/technologies your company serves
MEMS, Photovoltaic, Semiconductor

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