Kanomax Holdings

4104 Hoffman Road
White Bear Lake,  MN  55110-3708

United States
  • Booth: 5351

World Leader in Sub-20nm Particle Measurement

Kanomax FMT is the World Leader in Sub 20-nm Particle Measurement.  With instruments that measure particles down to 2nm, independent of composition or shape, our capability is out in front of the IRDS roadmap.

Stop by booth 5351 to see these exciting products:

  • The Scanning Threshold Particle Counter (STPC) is the first commercially-available on-line particle counter capable of detecting particles as small as 7 nm in UPW.  The STPC is great for monitoring organics, colloidal silica, filter breakthrough, and other yield killers in UPW that traditional OPC's miss.
  • The Nano SpotLight System (NSL) extracts and deposits individual particles in UPW > 5nm onto a << 1mm spot for easy SEM analysis.  The NSL is great for analyzing, fingerprinting, and troubleshooting UPW systems.
  • The Liquid Nanoparticle Sizer (LNS) gives actual (not relative) concentrations of colloidal suspensions from 6 to 360 nm.  The LNS is a great choice for characterizing and controlling CMP slurries.

Kanomax FMT products can help solve your toughest particle measurement and control challenges - please visit booth 5785 to learn how!


  • Nano SpotLight System
    Great for analyzing, fingerprinting, and troubleshooting UPW systems. * Collects 5 nm and above * Collects anything undissolved (Bacteria, organics, colloidal silica, etc.) * Collects particles in a << 1mm spot * Actionable insight in hours, not weeks...

  • The Nano SpotLight System is the latest addition to Kanomax FMT’s growing list of innovative technologies. Kanomax FMT partnered with Aerosol Devices and CT Associates to develop a new particle collection technique called Focused Aerosol Deposition or FAD.

    While the semiconductor industry has been able to count nanometer sized particles for decades it has struggled to identify the elemental composition of the particles. When a “particle event” affecting semiconductor yield occurs in a semiconductor manufacturing facility, knowing the composition of the contaminating particles can be crucial in identifying the source of the event and eliminating the problem. Traditional Scanning Electron Microscopy (SEM) methods of attempting to collect these particles on a 25mm filter requires a long sample collection time (usually of several weeks). But in situations like this speed is essential to minimize manufacturing disruption. The Nano SpotLight’s System typical collection time is only 24 hours — a much better option for the industry than SEM.

    FAD uses a NanoParticle Nebulizer (NPN) to produce a droplet distribution of the suspect Ultrapure Water (UPW). Once each droplet is dried the resulting particles, formed from either real particles or non-volatile residue, are delivered to the Spot Sampler. The Spot Sampler uses a three-stage growth tube:

    • Conditioner. The Conditioner establishes a controlled water-vapor-saturated aerosol stream.
    • Initiator. The Initiator provides a supersaturated region where water vapor condenses on the NPN-generated particles.
    • Moderator. The Moderator provides a final cool region to limit unwanted condensation before gently depositing the droplets onto a heated collection substrate. The “spot size” is as small as 0.005 mm in diameter.

    The substrate is either a 1 inch diameter silicon wafer or polycarbonate membrane mounted on a SEM stub. Once the collection surface is gold-coated the SEM technician can easily find the spot of particles in the exact center of the wafer and measure particle size as small as 5 nm. The technician can also perform Energy Dispersive Spectroscopy (EDS) analysis to identify the elemental composition of the particles.

  • Scanning Threshold Particle Counter
    Great for monitoring organics, colloidal silica, bacteria, and other yield killers in UPW that traditional OPC's miss *50% detection efficiency at 10 nm *Real-time, on-line *Counts particles of any shape, any refractive index, any composition ...

  • Current particle counting technology based on optical particle detection is inadequate to monitor particles at the line widths used in today’s semiconductor manufacturing facilities. The International Road Map for Devices and Systems (IRDS) roadmap for semiconductor manufacturing has needed sub-20 nm particle detection for several years. The ScanningTPC is the world’s first particle counter capable of detecting 10 nm particles in Ultrapure Water (UPW).

    In the ScanningTPC an ultra-fine nebulizer uses patented dual-sequential impactors to remove nearly all large droplets that might generate non-volatile residue particles of 10 nm diameter and larger. These large NVR particles interfere with the measurement of genuine particles in suspension. A patented size-selectable Condensation Particle Counter continuously scans particle sizes at 10 nm, 15 nm, and 20 nm with 50% detection efficiency.

    The response of the ScanningTPC is not dependent on particle refractive index or particle shape —unlike all Optical Particle Counter (OPC) or Laser Particle Counters (LPC) in use today. And also unlike all OPCs and LPCs the ScanningTPC does not use Polystyrene Latex (PSL) particles as a calibration material. The standard derivation for PSL particles < 40 nm becomes so large that they are almost unusable for the sizes measured by the ScanningTPC. Instead the ScanningTPC uses a variety of colloidal silicas traceable to the European Reference Materials colloidal silica standards.

    The ScanningTPC’s 50% detection efficiency at 10 nm allows particles as small as 7 nm to be counted. By contrast, the counting efficiency of OPCs and LPCs is only 3-5% at their rated particle detection size. As the ability of even the best filters to remove 10 nm and smaller particles drops dramatically, expect to see significant particle counts when using the ScanningTPC.

    ScanningTPC Advantages

    The ScanningTPC offers the following advantages:

    • Monitors particles ≥10 nm in real-time.
    • Rapid response time to detect changes in particle contamination levels. The response is not dependent on particle refractive index or particle shape.
    • Option to specify particle sizes for continuous (non-scanning) monitoring.
    • Calibrated with Colloidal Silica (European Reference Materials traceable)
    • Operates with either an in-house vacuum system or the internal pump.
    • Portable and easy to set up. Robust with minimal maintenance requirements.
    • Simple to operate using the intuitive front-panel-display menus.
  • Liquid Nanoparticle Sizer
    Great for CMP slurry, bio-pharma, and filter testing * 6 – 360 nm measurement range * Actual concentrations (not relative) * Any particle, any shape, any composition, any distribution (including multimodal) ...

  • Measuring the size and concentration of particles in colloidal suspensions is a challenge, particularly for suspensions with particles smaller than 100 nm. Kanomax FMT offers a solution that outperforms all other measurement methods — the Liquid NanoParticle Sizer system (LNS). The LNS provides outstanding size measurement capabilities in a small integrated instrument system. The LNS is an excellent choice for measuring particle size distributions in semiconductor Chemical Mechanical Planarization (CMP) slurries.

    The LNS is a fully integrated three-stage system incorporating a NanoParticle Nebulizer (NPN), an Annular Flow Ion Mobility Classifier (AFIMC) and a Fast Condensation Particle Counter (FastCPC) to measure particles as small as 5 nm.
    Three-stage system:

    1. A sample of a liquid colloid suspension is introduced to the NPN through an online direct-feed method or using a peristaltic pump or autosampler. The sample can be diluted before introduction to reduce coagulation time and minimize contamination. The sample is nebulized and the largest droplets, which may contain multiple particles, are removed. The nebulized sample is heated to evaporate the water leaving an aerosol of particles suspended in the carrier gas.
    2. The aerosol particles are electrically charged using a safe and reliable soft x-ray charger. The AFIMC sorts the particles by size in an electric field and is capable of classifying particles from 5-6oo nm in size. Using varying electric field strength the AFIMC systematically selects particles of a narrow size band and passes them on to a FastCPC.
    3. The FastCPC immediately counts the concentration of particles in selected size bands and detects individual particles with a dynamic concentration range over three orders of magnitude. Unlike competing particle measurement technologies, the LNS provides actual, not relative, particle concentration.

    Advantages of the LNS

    The LNS offers the following advantages over competing technology:

    • Combines proven techniques (used by NIST and AIST, Japan) for counting and sizing aerosol size distributions with a unique nebulizer technology to successfully measure particle size and number concentration in concentrated liquid suspensions.
    • Offers greater accuracy, better precision, and improved resolution in CMP slurry size-measurement results (used extensively in the semiconductor industry).
    • Straightforward data inversion without complex inversion routines, assumptions or size calibrations. The software can identify each particle-size mode and assigns a cumulative size at 10%, 50% and 90% of the distribution. Changes in the size of a specific mode can be easily monitored with these size statistics.
    • Does not make assumptions about the shape of the particle size distributions and measures actual number concentrations not relative particle concentrations. (Instruments that provide relative particle concentrations can lead to significant misinterpretations when comparing different samples because they only provide measurements of relative concentrations within each sample.)
    • Cited in two SEMI Guides. In SEMI C92 the LNS is used to determine the quality of ion exchange resin. In SEMI C79 the LNS evaluates the efficiency of sub-15 nanometer filters used in ultrapure water distribution systems. No other particle instrumentation is capable of making the required measurements described by SEMI C79.

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