KBTEM-OMO

2 Partizansky Avenue
Minsk,  220033

Belarus
http://www.kb-omo.by
  • Booth: 1953


KBTEM-OMO: Bringing Traditions Into The Future!

KBTEM-OMO (Belarus) is:

  • Over 50 years in microelectronics engineering
  • High level vertical integration in design and manufacturing
  • Field proven tools for 1 µm, 0.6 µm, 0.35 µm, 0.13 µm and 90 nm technology node
  • Total solution provider for defect free mask manufacturing
  • Maskless lithography solution
  • Variety of wafer inspection systems
  • Unique solution for double-side lithography
  • Brand new tools only, no secondhand or refurbished tools

KBTEM-OMO performs scientific and technical development and production of special opto-mechanical process equipment as well as inspection and measurement equipment used in microelectronics products manufacture:

  • laser pattern generators for mask and wafer patterning;
  • wafer steppers;
  • large-field steppers;
  • mask aligners;
  • laser-based mask repair systems;
  • automatic mask inspection systems with high detection threshold,
  • wafer inspection tools for macro and micro defect inspection

KBTEM-OMO's unique in-house manufacturing facilities for precision mechanical and optical parts and components, linear step motor fabrication, certified quality and inspection lab provides for high vertical integration in engineering of opto-mechanical special systems and equipment.


 Products

  • MASK FABRICATION EQUIPMENT
    A tool range for Mask Fabrication with unique compatibility of all systems, including: - coordinate systems; - stage travel control algorithms; - coordinate systems’ compensation; - data conversion for pattern generation and mask inspection and more....

  • MASK PATTERN GENERATORS

    • 130, 90 nm UV, DUV laser tools

    • Multi-beam raster-scan technology

    • Phase shift mask production

    • Direct substrate patterning option

    • 16/32-beam optical architecture

    AUTOMATIC MASK PATTERN INSPECTION

    •130nm, 90 nm technology node

    •0.25, 0.15, 0.065 µm pixel size

    •Die-to-Database inspection to SEMI standards

    •High throughput

    LASER MASK REPAIR

    • 0.2, 0.15 µm min feature size

    • Process switch to opaque/transparent defects repair

    • Pattern copy repair

    • Through pellicle repair

  • WAFER PATTERNING AND INSPECTION EQUIPMENT
    Tool range including: Laser writers (maskless lithography); Mask Aligners; Wafer Steppers; Non-patterned wafer defect inspection; Automatic wafer pattern defect inspection....

  • MASKLESS LITHOGRAPHY

    •1.0, 0.6, 0.35 µm single- and multi-beam laser pattern generators

    • Process switch to substrate/mask writing modes

    • Ø300, 200, 150, 100 mm

    MASK ALIGNERS

    • Contact / proximity printing

    • Automated / manual wafer loading

    • Double-side lithography

    • High alignment accuracy 0.4 ~0.7 um resolution

    - wedge compensation and wafer thickness compensation with no contact to mask;
    - 3D (X, Y, Q) high precision wafer manipulator with coarse and fine alignment modes;
    - irregular substrates type and size ( wafer thickness 0.2~0.8 mm, fragile wafer types (GaAs, LiNbO3, etc.) , rectangular;
    - built-in vibration protection unit;
    - energy saving mode.

    STEPPERS

    • Lamp / solid state laser light source

    • 0.8, 0.35 µm technology node

    • Automatic scaling

    • Double-side alignment

    • Ø200, 150, 100 mm wafers

    AUTOMATIC WAFER DEFECT INSPECTION

    • Micro / macro defects inspection

    • Imposed defects inspection

    • High resolution

    • Low cost of ownership (COO)

    WAFER INSPECTION

    • CD inspection

    • Wafer flatness inspection

    • Coordinates and overlay inspection

    • Visual inspection

  • OPTICAL PARTS AND COATINGS
    State of the art optical parts and coatings tailored to customer needs...

  • - Lens (including diffraction), prisms, wafers, magnifying glass;

    - Bifocal spheroprismatic components;

    - Spherical aerostatic  bearings;

    - Reflectors, obtained by vacuum bending;

    - Certified and testing photomasks;

    - Extra precise grids, masks, scales; linear and angular targets, limbs, raster grids;

    - Diffraction grating (including dividing grating, redistributing radiation in equal intensity), diffraction focuser, laser radiation converters (including converters into line, dots range, intersecting lines, ring);

    - Microlens rasters on the optical glass and cylindrical lens;

    - Components cells biraster;

    - Diffusers, homogenizers;

    - Optical coatings: interference, polarize, antireflected. 


 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
No
Product Demonstrations:
No
Please indicate which industries/technologies your company serves
Semiconductor

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