July 12-14, 2016
San Fransisco, CA
Over 100 years of combined ion source experience.
Kaufman & Robinson can assist you with your film depositions, etching processes, and material modifications. Currently, Kaufman and Robinson is introducing its newest RF gridded ion source: RFICP 380. Following our already popular RFICP product portfolio, the 360 product is powered by an inductively coupled discharge and benefits from our dedicated arc handling design implemented in the KRI® 1510 Ion Optics Controller. The RFICP 380 is the largest source in our portfolio and is intended to fulfill the market need for large area processing. Driven by market demand, the original configuration offers molybdenum, three grid, collimated ion optics for low energy processes. This ion optics design utilizes our well established and patented µ-dished technology. Future product plans include configurations optimized for mainstream ion/plasma beam processes such as ion beam assisted deposition and ion beam sputtering.