LPE S.p.A.

Via Falzarego 8
Baranzate , Milano,  I-20021

Italy
http://www.lpe-epi.com
  • Booth: 6363


Visit LPE @ booth 6363 for Si & SiC Epi & bulk material.

Process Equipment:  SIC Bulk reactors, Silicon and SiC EPI-Epitaxy-Epitaxial Reactors.  Specifically suited for thick epi applications used for power management, sensors and epitaxially MEMS and bulk SiC raw material.  

www.lpe-epi.com


 Products

  • PE106-PE106A SiC Epitaxial Reactor
    Silicon Carbide Epitaxial Reactor PE1O6 & PE1O6A =- Single wafer 150mm epitaxy reactor - Load lock for inert purge between runs - Smallest footprint ...

  • Silicon Carbide Epitaxial Reactor PE1O6 & PE1O6A  
    - Single wafer 150mm epitaxy reactor 
    - Load lock for inert purge between runs
    - Smallest footprint

    -  Super thick epitaxial layers 
    - Multilayer (p and n) in one run

    - Growth rate: up to 90 µm/h
    - Lowest CoO 
    -The PE1O6A is equipped with a Cassette to Cassete module that makes the Reactor fully automated

  • Silicon Epitaxial Reactor PE3061D
    Silicon Epitaxial Reactor PE3061D The new Silicon Epitaxial Reactor PE 3061 reactor’s chief characteristics can be summarized as follows: ...

  • Silicon Epitaxial Reactor PE3061D 
    The new Silicon Epitaxial Reactor PE 3061 reactor’s chief characteristics can be summarized as follows: 

    -Small batch, cassette to cassette,  Silicon Epitaxial with unbeatable throughput.
    -Wafer quality as close as possible to single wafer reactors
     
    -Cost of ownership as close as possible to batch reactors 
    -Thick film deposition capability (up to 200u) 
  • Bubbler
    Bubbler Run-to-run growth rate stability often is at issue for epitaxial reactors. Since it is primarily affected by the way silicon is controlled and distributed, usually it does not greatly depend on reactor design. ...

  • Bubbler
    Run-to-run growth rate stability
     is
    often an issue for epitaxial reactors. 
    Since it is primarily affected by the 
    way silicon is controlled 
    and distributed it usually does not 
    greatly depend on reactor design. 

    LPE has developed a tool 
    to significantly improve 
    this key factor
    (patent pending), known as
    "Bubbler"

    Our Bubbler has been widely tested 
    on our LPE reactor as well on other brands of reactors, on both  
    single-wafer and batch type systems. 


 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
No
Product Demonstrations:
No
Please indicate which industries/technologies your company serves
MEMS, Power Semiconductors, Semiconductor, Sensors

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