The Annealsys MC-100 system is a 4-inch (100 mm) DLI-CVD / DLI-ALD reactor dedicated to complex oxides deposition.
The association of the heating system with the direct liquid injection vaporization system makes this system unique for material research. It offers the capability to deposit most of the materials of the periodic table with multi process capability inside the same process chamber.
The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allow utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows with the by-pass valve provide perfect interface control for deposition of nanolaminates.
The automated liquid panel is optimized for reduced consumption of chemical precursors. The no dead volume design provides full rising capability for easy change of chemicals and refilling of the precursor tanks in a glove box.
Applications: oxides, metals, nitrides, 2D materials (TMD), etc.