MUEGGE GmbH

Hochstrasse 4 - 6
Reichelsheim,  D-64385

Germany
http://www.muegge.de
  • Booth: 5861

MUEGGE is a leading supplier of scalable plasma technology for Photovoltaic, Flat Panel Display and Semiconductor applications as well as Remote Plasma Source (RPS) applications in the Semiconductor and MEMS markets.

Muegge has a strong expertise in Strip/Removal tools which enable a fast dry etch process for SU-8, KMPR and PMMA. This is a key process technology for Semiconductor and MEMS fabrication.

Further examples of MUEGGE's stripping applications are in the "Semiconductor Backend" area as Stress Relief Etching after Grinding and Recess Etching for the Through Silicon Via Technology (3D integration).

In the "Semiconductor Frontend" MUEGGE's offers a Remote Plasma Source for isotropic etching of Silicon and Silicon compounds, as well as scalable plasma arrays for plasma enhanced deposition and chamber cleaning.

 Products

  • RADICAL PLASMA SOURCE MA-SERIES
    RADICAL PLASMA SOURCE MA-SERIES...

    • The RPS MA3000 series is designed for the usage at vacuum chambers. Typical process pressures are between 0.3 Torr and 5.0 Torr.

    A Remote Plasma Source (RPS) is defined by the fact that a plasma is only generated and existing in the RPS itself, not in the process chamber.

    No plasma, only radicals are reaching the process chamber. Therefore the RPS system is ideal for applications which necessarily need to avoid physical effects as ion bombardment and high thermal load.

  • PLASMA ARRAY - SCALABLE PLASMA SOURCE
    PLASMA ARRAY - SCALABLE PLASMA SOURCE...

    • A combination of Duo-Plasmalines can be used to obtain a two dimensional plasma array. Single sources as well as 2, 4 and 8 parallel arranged Plasmalines are available for plasma assisted surface treatment like surface activating, etching and deposition.
    The Duo-Plasmaline is a direct microwave plasma source without using a magnetic field. In a simplified description, it works like an inverse luminescent tube excited by microwaves.
  • PLASMA DECAPSULATION TOOL
    PLASMA DECAPSULATION TOOL...

    • Muegge’s plasma decapsulation tool has been developed for the fast etching of mould compound and polyimide to open microchips without attacking the sensitive wiring.

    • Optimized for decapsulation of microchips
    • Short decapsulation time at gentle process conditions
    • Removal rate approx. 200 µm per hour
    • No attack on wiring (e.g. Cu, Pd - Cu and Ag materials)
    • Slight attack of chip passivation
    • Fast, isotropic etching by radicals only
    • No ions, no radiation, no el. fields at sample

 Additional Info

New Exhibitor:
No
New Products:
No
Displaying Equipment:
Yes
Product Demonstrations:
No
Please indicate which industries/technologies your company serves
MEMS, Photovoltaic, Semiconductor

Categories

207 Process Equipment
  • Deposition; (CVD, PVD, ALD, Plating)
    • 401 Sub-systems
  • Plasma Sources; Controls; Monitoring; Diagnosis
  • Power Supplies; RF Generators; Converters; Electrical Cond.
    • 101 Photovoltaic Device Manufacturing
  • PV: Cells
    • 204 MEMS Equipment
  • Deep RIE etching; Dry Etching
    • 206 PV Equipment
  • Thin Film

    • Send Email

    Type your information and click "Send Email" to send an email to this exhibitor. To return to the previous screen without saving, click "Reset".

    Loading ...

    :
    :


    Legend
    Available Timeslot
    Scheduled Appointment
    Personal Appointments
    Appointment Request
    Blocked Timeslot
    Restricted Timeslot
    Cancelled
    Declined
    For Technical Support with this webpage, please contact support.