The RPS MA3000 series is designed for the usage at vacuum chambers. Typical process pressures are between 0.3 Torr and 5.0 Torr.
A Remote Plasma Source (RPS) is defined by the fact that a plasma is only generated and existing in the RPS itself, not in the process chamber.
No plasma, only radicals are reaching the process chamber. Therefore the RPS system is ideal for applications which necessarily need to avoid physical effects as ion bombardment and high thermal load.