Pall Corporation

25 Harbor Park Dr
Port Washington,  NY  11050-4605

United States
  • Booth: 6044

Welcome to Pall Corporation - Please stop by Booth 6044

In-Booth Poster Sessions:  Pall Corporation will be hosting several poster sessions to address the contamination control in advanced Lithography, Wet Etch and Cleans and CMP applications.  Each session will be help on Tuesday and again on Wednesday at the following times in the Pall Booth, North Hall #6044:


11 am – 12 pm:  Contamination Control Toolbox for Advanced Lithography Filtration

1:30 pm – 2:30 pm:  Contamination Control Toolbox for Advanced Wet Etch and Cleans Filtration

3:00 pm – 4:00 pm:  Filtration Optimization Toolbox for Advanced CMP Slurries


  • XpressKleen™ XP2 Filter
    The XpressKleen XP 2 nm filter is the next generation of PTFE membrane filters that remove particles down to 2 nm and made of all high purity fluoropolymer materials....

  • The XpressKleenTM XP2 filter series provides the most advanced PTFE membrane filtration available. It is tailored to address the severe contamination needs of the leading edge of integrated circuit manufacturing. A new level of material cleanliness maintains fluid purity with ultra-low levels of 30 critical metal ion extractables and measured levels of NVR, TOC, organics and surface particles.

    The self-contained capsule filter is suitable for use from the point of supply (POS) to the point of process (POP) to help complete a contamination control system that delivers the required fluid purity to the wafer. This is accomplished by Pall’s completely integrated manufacturing capability. It monitors and controls component purity and filter performance throughout device production.

  • XPR3 Sub 1 nm PE-Kleen filter
    XPR3 Sub 1 nm PE-Kleen filter — The new filter, rated as sub 1 nm, is constructed of ultra-high purity, high density polyethylene (HDPE) media and high-density polyethylene (HDPE) hardware materials....

  • The new filter rated as sub 1 nm is constructed of ultra-high purity, high density polyethylene (HDPE) media and high-density polyethylene (HDPE) hardware materials. HDPE is a high-performance material known for its superior hard particle removal, making it ideal for most chemicals used in the advanced lithography processes including leading edge EUV resist materials.  It offers a significant improvement in cleanliness and particle removal over traditional lithographic filter materials. 

    “Pall’s lithography filters are known for superior defect reduction capability,” said Michael Mesawich, Vice President of Pall’s Global Product Planning Group. “The new sub -1 nm PE-Kleen filter is an additional tool for advanced lithographers to use in their defectivity reduction strategies.”

    The new sub 1 nm PE-Kleen filter undergoes Pall’s Xpress cleaning process, which results in superior metal, organic and particulate cleanliness, specifically designed for the most advanced patterning chemistries. The combination of the finest removal rating and the Xpress cleaning results in a superior defect reducing filter combination. 

    To learn more about the new PE-Kleen filter and other Pall Microelectronics technology solutions, please visit .

  • The Profile® III Filter
    The next generation of Pall CMP depth filters. Available in 0.3 and 1.0 um grades, the Profile® III is designed to replace traditional depth filters while further reducing slurry LPC’s, improving cost of ownership and increasing overall throughput....

  • The Profile® III filter series incorporates Pall’s proprietary continuous gradient pore structure technology.  The Profile III technology was optimized and specifically designed for fine slurry applications.   The design allows customers to move to finer rated filters to reduce LPC’s and scratch defects while maintaining excellent flowrate and lifetime characteristics.  The design also allows for extending filter life over traditional similarly rated depth filters.

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LED/solid state lighting, MEMS, Photovoltaic, Plastic/organic/flexible electronics, Power Semiconductors, Semiconductor, Flexible and Printed Electronics-, Sensors

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