Precision Polymer Engineering Ltd.

2045 Martin Avenue, Suite 206
San Jose,  CA  95050

United States
https://www.prepol.com
  • Booth: 1061


Welcome to Precision Polymer Engineering (PPE)

Precision Polymer Engineering (PPE) has been delivering innovation and expertise in high performance elastomers and durable sealing materials for over 40 years, offering a diverse product range. Recent PPE innovations for the semiconductor industry are next generation Perlast perfluoroelastomers and Kimura elastomers - each offering enhanced performance and outstanding resistance to environmental conditions.

PPE's sealing solutions are engineered to provide excellent mechanical properties, with extended high temperature performance and improved chemical resistance over standard elastomers.

PPE compounds are based on cutting-edge polymer technologies, ensuring excellent plasma resistance. Through ultra-pure grades without fillers of any kind, particle generation is eliminated.

We hope you enjoy the show!


 Press Releases

  • Precision Polymer Engineering (PPE) has released Perlast® Helios G7HA, an FFKM sealing material for semiconductor applications proven to deliver superior plasma resistance.

    Precision Polymer Engineering (PPE), manufacturer of high-performance sealing technology, has launched Perlast® Helios G7HA as a new material for the critical semiconductor market. In extensive testing, Perlast® Helios G7HA outperformed competitor materials in aggressive plasmas – including high concentrations of fluorine radical plasmas – at temperatures up to 310°C.

    “Perlast® Helios G7HA is a step change in semiconductor equipment sealing,” said Ben Green, Business Line Manager for Semiconductor at PPE.

    “This new material has been developed in line with what our customers have been asking for – a fully organic FFKM which delivers outstanding plasma resistance in high temperatures. We’re delighted with the results from laboratory testing and customer trials. We’re confident that G7HA will play a key role in cutting equipment downtime and reducing overall cost of ownership across a wide range of semiconductor applications.”

    Outperforms in harsh plasma environments

    Perlast® Helios G7HA has been tested extensively in a series of plasma environments (RPS NF3, RIE NF3, CCP NH3, RIE SF6, RIE O2 and CCP O2). In each environment, the new G7HA grade demonstrates a significantly lower plasma erosion rate than leading competitors – and 27% lower in NF3.

    G7HA eliminates trade-off between purity and plasma performance

    Previously in the semiconductor sealing market, compromises had to be made between seal purity and high performance in plasma environments. Perlast® Helios G7HA is one of the first elastomer innovations to give reliable results across both purity and resistance to aggressive plasmas.

    Lower trace metals than other plasma-resistant FFKMs

    Perlast® Helios G7HA is a fully organic material grade, with analysis showing extremely low trace metal levels and low particle generation when measured against comparable FFKM and FKM sealing materials. Low trace metals and low particle generation are key to reducing process contamination, significantly increasing yield and reducing operational downtime.

    Perlast® Helios G7HA has been developed for use in wet and dry semiconductor processes, including etching, stripping and cleaning. The new material is expected to be moulded into dynamic and static sealing products, including isolation valves, chamber O-rings and gas inlet seals.

    Perlast® Helios G7HA is the latest material grade to join the Perlast® family of perfluoroelastomer (FFKM) elastomers. Perfluoroelastomer is the most chemically resistant elastomer available, and is effectively a rubber form of PTFE. Perlast® seals are used in critical sealing applications where purity and performance are paramount.

    Precision Polymer Engineering will be showcasing Perlast® Helios G7HA at SEMICON West 2019 in San Francisco, between 9-11 July (Booth #1061).

    ** END OF PRESS RELEASE **

    Contact for information or further quotes:

    Ryan McNulty – Marketing Executive, Precision Polymer Engineering

    Email: rmcnulty@idexcorp.com

    Tel: +44 1254 291 873

    Notes to Editor:

    About Precision Polymer Engineering

    Precision Polymer Engineering Ltd (PPE) is a leading provider of high performance O-rings, technical rubber mouldings and sealing solutions to a diverse range of industries across the world.

    Founded in 1975, with its head office in Blackburn, England, PPE operates manufacturing facilities in the UK and the US, plus sales offices and dealers across the US, Europe and Asia. The company’s success is based on the continual development of new elastomer materials combined with exceptional levels of customer service and technical support.

    About IDEX Sealing Solutions

    Precision Polymer Engineering (PPE) is a member of IDEX Sealing Solutions – an applied solutions provider serving niche markets worldwide. IDEX is a leader in creating and enabling technology and improving business prospects for a diverse customer set across the globe.


 Products

  • Perlast Helios G7HA
    Perlast Helios G7HA is a high purity perfluoroelastomer (FFKM) that offers outstanding long-term mechanical performance and excellent plasma resistance, in high temperature semiconductor applications of up to 310°C....

  • Perlast® Helios G7HA is a high purity perfluoroelastomer (FFKM) that offers outstanding long-term mechanical performance and excellent plasma resistance in high temperature semiconductor applications of up to 310°C.

    This 70 A Shore FFKM is fully organic in formulation, offering extremely low trace metal levels for higher yields and reduced process contamination.

    Perlast® Helios G7HA – the first material in the range – has undergone rigorous benchmarking tests against the leading sealing materials currently on the market in order to qualify its material characteristics.

    The test results demonstrated excellent sealing performance at temperatures up to 310°C. The new elastomer grade also outperforms competitor materials against aggressive plasmas, including high concentrations of fluorine radical plasmas.

    Outperforms in harsh plasma environments

    Perlast® Helios G7HA has been tested extensively in a series of plasma environments (RPS NF3, RIE NF3, CCP NH3, RIE SF6, RIE O2 and CCP O2). In each environment, the new G7HA grade demonstrates a significantly lower plasma erosion rate than leading competitors – and 27% lower in NF3.

    Lower trace metals than other FFKM seals

    Perlast® Helios G7HA is a fully organic material grade, with analysis showing extremely low trace metal level contaminates and low particle generation when measured against comparable FFKM and FKM sealing materials. Low trace metals and low particle generation are key to reducing process contamination, significantly increasing yield and reducing operational downtime.

    Perlast Helios G7HA removes trade-off between purity and performance

    Previously in the semiconductor sealing market, choices had to be made between seal purity and high performance in a sealing system – and particularly so with purity versus plasma resistance. Perlast® Helios G7HA is one of the first elastomer innovations to give reliable results across both purity and resistance to aggressive plasmas and chemical media.

    Typical applications

    Developed for use in various semiconductor applications. Suitable for use in wet and dry semiconductor processes including:

    • Etching

    • Stripping

    • Cleaning

    • LPCVD, HDPCVD, PECVD, SACVD, ALD, PVD, MDP, EPI

    Seal types

    Perlast Helios G7HA material can be moulded into dynamic and static sealing products, including isolation valves, chamber O-rings and gas inlet seals.


 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
Yes
Product Demonstrations:
No
Please indicate which industries/technologies your company serves
Semiconductor

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