Vistec Electron Beam GmbH

Ilmstrasse 4
Jena,  D-07743

Germany
http://www.vistec-semi.com
  • Booth: 1451


We understand E-BEAM.

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.

The company headquarters are located in Jena, Germany, with office and manufacturing facilities including 740 m² cleanroom space for assembly and qualification. Vistec Electron Beam also maintains service and support centers in Western Europe, Asia and in the US.


 Products

  • Vistec SB250er series
    Vistec’s SB25oer series áre fully automated, high performance, cost-effective electron-beam lithography systems designed for use in both industry and advanced research....

  • Based on the Variable Shaped Beam (VSB) principle, these tools are utilized in a wide range of existing and emerging semiconductor and nanotechnology applications including silicon direct write, compound semiconductor, mask making, integrated optics and silicon photonics

    The Vistec SB250er series are reliable, field proven systems with high throughput rates suitable for 24/7 production environments. Numerous worldwide installations are supported by an efficient international service organization.

  • Vistec SB3050er series
    The Vistec SB3050 series is our commitment to semiconductor manufacturing professionals....

  • The Vistec SB3050 series - with a Cell Projection option - is designed to meet the challenges of direct patterning down to the 32nm technology node and features Variable Shape Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimisation.

    Our industry proven 300mm design concept has been successfully utilized in more than 10 installations worldwide.

    The Vistec SB3050 series combines state of the art substrate handling with a high-precision stage system and a sophisticated electron-optical 50 keV column specifically developed to ensure excellent resolution performance.

    Thanks to the production-compatible Graphical User Interface (GUI) the Vistec SB3050 can be easily integrated into automated production environments (CIM). Being capable of exposing both masks (including templates) and wafers, the SB3050 exposure tools are the ideal bridge to next generation technology nodes.


 Additional Info

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MEMS, Other, Semiconductor

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