Trion Technology

2131 Sunnydale Boulevard
Clearwater,  FL  33765

United States
http://www.triontech.com
  • Booth: 332


Custom Plasma Etch (RIE) & Plasma Deposition (PECVD) Systems

Trion Technology designs, manufactures, markets and services versatile plasma equipment (ICP-RIE, PECVD, PVD, Ashers, and more) to enable our customers in the Semiconductor, MEMS, LED, RF Power, F.A., Opto-, III-V, Wafer Level Packaging, Thin Film Head, and Solar industries.

GaN Etch, GaAs Etch, SiO2 Etch, Si02 Deposition, Si3N4 Etch, Si3N4 Deposition, and more.

Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability. If you wish anything from full-blown production cluster tools to a simple laboratory system, Trion makes it.

Click: http://www.triontech.com
Email: info@triontech.com
Phone: +1 727 461 1888


 Products

  • Trion Technology -Oracle Production Cluster System
    Oracle Production Cluster System...

  • The Oracle is the smallest and most flexible full production cluster system on the market. The system consists of a Central Vacuum Transport (CVT), Vacuum Cassette Elevators and up to four Process Reactors. These process reactors are docked to the central loadlock and run in production-mode or can be operated independently. The Oracle can also be configured for either the laboratory environment (with single wafer loading) or for full production (with vacuum cassette elevators).

    Because the Oracle accommodates up to four separate process chambers, there are many possible process combinations, including ash, etch, and deposition modules. Processes are safely run without atmospheric contamination since all chambers are vacuum loadlocked.

    http://triontech.com/etch-platform/oracle-cluster/

  • Trion Technology - Phantom RIE Reactive Ion Etcher
    Phantom RIE Reactive Ion Etch System...

  • The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.

    Phantom RIE: 
    http://triontech.com/etch-platform/phantom-rie/

    Phantom RIE-ICP: 
    http://triontech.com/etch-platform/phantom-icp/

  • Trion Technology - Apollo Stripper
    Apollo Stripping System...

  • The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo Stripper is a compact, inexpensive, and versatile system which can be configured for a 200mm or 300mm Chuck. By employing RF bias power, difficult to remove layers of resist can be removed at low temperatures. As required by application, this system can incorporate a microwave source (which is both reliable and free from typical microwave tuning problems) or ICP technology.

    • Etch rates up to 6um/min
    • High throughput
    • Low plasma damage
    • Automatic tuning
    • 100mm to 300mm wafers
    • Small footprint
    • Competitively priced

    http://triontech.com/plasma-ashing/apollo/


 Additional Info

New Exhibitor:
No
New Products:
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Displaying Equipment:
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Product Demonstrations:
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Please indicate which industries/technologies your company serves
LED/solid state lighting, MEMS, Other, Photovoltaic, Plastic/organic/flexible electronics, Power Semiconductors, Semiconductor, Flexible and Printed Electronics-, Sensors
If you checked Other, please indicate your Company Industry
RF Power, Failure Analysis, Opto-, III-V, Wafer Level Packaging, Thin Film Head, Solar

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