5470 Nobel Drive
Fitchburg,  WI  53711

United States
  • Booth: 2039

CAMECA welcomes SEMICON West 2109 attendees!

CAMECA is a world leading supplier of microanalytical and metrology instrumentation for research and process control. Our instruments measure elemental and isotopic composition in materials down to atomic resolution and equip government and university labs as well as high-tech industrial companies around the world. Learn how we address challenging characterization needs in diverse markets: semiconductor, nanotechnology and novel materials, nuclear science, energy, biology, environment, mining, and geology.

Extreme sensitivity, low detection limits, high productivity; CAMECA microanalytical instruments are recognized throughout the international IC community as best-in-class for investigation on new materials and structures for semiconductors. CAMECA also develops high performance process control systems supporting the high volume production of latest generation electronic devices.


  • LEAP 5000
    3D Atom Probe Microscope with unmatched 3D sub-nanometer performance. The LEAP 5000 is CAMECA's cutting-edge atom probe microscope, offering superior detection efficiency across a variety of materials: more than 40% extra atoms detected per nm3 analyzed....

  • The LEAP 5000 collects nanoscale information from a microscale dataset in just a few hours and delivers improved compositional accuracy, precision and detection limits, enhanced sample throughput together with increased yield and ultimate reproducibility.

    • Optimized detection efficiency provides unparalleled sensitivity
    • Large Field-of-View and detection uniformity - the ultimate 3D spatial resolution
    • Excellent multi-hit detection capabilities for the most accurate compositional measurements
    • Fast and variable repetition rate for ultra-high speed data acquisition 
    • Robust & ergonomic platform for increased ease-of-use and reduced time-to-knowledge
    • Live-time monitoring to ensure the highest quality data in every measurement
    • Advanced laser control algorithms provide measurably improved sample yields

    The LEAP 5000 Family

    LEAP 5000 XS
    The LEAP 5000 XS combines new flight path technology with enhanced detector performance to offer improved field of view whilst achieving unprecedented detection efficiency ~ 80%, the highest of any such analytical technique! In addition, the advanced laser pulse module capable of offering repetition rates of up to 2 MHz makes the LEAP 5000 XS the ultimate in efficiency and productivity.

    LEAP 5000 XR
    The LEAP 5000 XR incorporates the advanced reflectron design and enhanced detector performance (detection efficiency increased to ~ 50%) and adds all the benefits of advanced laser pulsing capable of repetition rates of up to 500kHz. The LEAP 5000 XR is the most capable atom probe across the widest variety of research and development applications.

    LEAP 5000 R
    An improved voltage pulsing system capable of 40% greater pulse amplitudes and pulse repetition rates up to 500 kHz together with a new advanced reflectron design and enhanced detector performance makes the LEAP 5000 R the most powerful voltage mode atom probe ever produced.
    The Only In-Line, Fully Automated SIMS...

  • The AKONIS platform fills a critical gap in the semiconductor fabrication process by providing a fast tracking of compostional changes and conformity directly in the fab line. Complementing the IMS Wf/SC Ultra and the SIMS 4550 currently used to support the semiconductor industry via off-line characterization labs, AKONIS is the only fully automated Secondary Ion Mass Spectrometer that will make SiGe and SiP process monitoring possible in high volume manufacturing environments.

    The AKONIS offers:

    • Fast and precise high resolution depth profiling of epitaxial processes
    • Blanket and patterned wafer measurement in pad down to 35 microns
    • Intuitive recipe creation making SIMS data accessible to non-experts
    • A fully automated SEMI compliant platform with >95% uptime
  • IMS 7f-Auto
    Versatile SIMS Tool: Reference Detection Sensitivity with High Throughput & Full Automation ...

  • The IMS 7f-Auto is the latest version of our successful IMS xf Secondary Ion Mass Spectrometer (SIMS) product line. Designed to deliver high precision elemental and isotopic analyses with increased ease-of-use and productivity, it has been optimized for challenging applications such as glass, metals, ceramics, Si-based, III-V and II-VI devices, bulk materials, thin films... fulfilling industry requirements for efficient device development and process control.

    Key analytical features for solving a wide range of analytical problems
    The IMS 7f-Auto offers unparalleled depth profiling capabilities with high depth resolution and high dynamic range. The high transmission mass spectrometer is combined with two reactive, high-density ion sources, O2+ and Cs+, thus providing high sputter rate and excellent detection limits. A unique optical design allows both direct ion microscopy and scanning microprobe imaging.

    Improved automation & operation efficiency
    The IMS 7f-Auto is equipped with a redesigned, in-line primary column for easier and faster primary beam tuning and optimized primary beam current stability. New automated routines minimize operator related biases and improve ease-of-use. A motorized storage chamber with automated load / unload of sample holders ensures high throughput through analysis chaining and remote operation.

    High reproducibility at high throughput
    Thanks to its new motorized storage chamber & sample transfer, the IMS 7f-Auto can analyze multiple samples in chained or remote mode. Measurements can be fully unattended and automated, with unequalled throughput and reproducibility. Ultimate reproducibility can be achieved (RSD < 0.5 %), together with excellent detection limits, high throughput and productivity (tool can be used 24h a day with minimum operator intervention).

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Power Semiconductors, Semiconductor

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