Ebara Technologies, Inc.

51 Main Ave
Sacramento,  CA  95838-2014

United States
  • Booth: 1539

Welcome to EBARA Technologies, Inc.

EBARA strives to understand the needs for each market we serve, from Semiconductor, Compound Semiconductor, and Solar / PV manufacturing to General Industrial, University and R&D. EBARA's innovative technologies provide value to a wide range of vacuum technology and exhaust gas management to advanced technologies to front end and back end semiconductor manufacturing.

As a leading global supplier for the Semiconductor Industry, Ebara Technologies, Inc. provides a broad product portfolio which is divided into two divisions: Components Division and System Equipment Division. Our Components Division provides state of the art vacuum exhaust management systems with Dry and Turbomolecular Vacuum Pumps, and Point-of-Use Abatement systems. Whereas our System Equipment Division concentrates on Wafer Processing Equipment for Chemical Mechanical Polishing, as well as advanced Electro-Plating and Bevel Polishing equipment used in the manufacturing of semiconductors.

Let us provide your complete vacuum and exhaust management solution!

 Press Releases


  • Model EV-L
    The EV-L Series are a multistage dry vacuum pumps engineered for applications ranging from clean to medium duty processes. The EV-L Series covers a wide pumping speed range from 10,000 L/min to 50,000 L/min with an ultimate pressure as low as 1 mTorr....

  • The EV-L  Series are the sucessor to the Model ESR line. Primarily to be used for intermediate applications, the Model EV-L comes in different units to match your vacuum needs. The Model EV-L vacuum pumps achieve a low cost of ownership by integrating precision machining, multiple pumping stages, improved DC motors and motor controls. These enhancements drasticly reduces utility consumption (electrical power, cooling water, nitrogen, footprint) compared to AC motored pumps. Intelligent controls allow the EV-L to be throttled down and be placed in an idle mode when not used for processing.

    For clean applications, no nitrogen purge is required. A minimal amount of nitrogen purging along with the pump constructed out of NiResist (homogeneous steel alloy with high nickel content) makes the EV-L ideal for pumping corrosive gases.

  • Ceramic Fiber Cloth Heater Jackets
    Cloth Style Heater Jackets reach an operational max temperature of 220 Degrees C and powered with 120 -240V. Heater Jackets are available for line diameters as small as ¼” up to 8” and custom jackets are available....

  • Cloth style Heaters containing heating element and built in insulation for uniform temperature control, standard lengths and custom design to fit options.  Uniform High-temperature range (with standard components, max 220 Degrees C) and built in High and low limit thermostats.  Control options include “Individual Control” heating for uniform heater control (Each heater is monitored in individually in real time using a touchscreen control unit) and Zone control (Separate strings that are monitored collectively).  Standard as 120 – 208V, heater diameters are available from ¼” to 8” with existing designs for Flanges, Elbows, Valves, etc.  Heaters have easy on and off capabilities with standard Hook and Loop fasteners.  Heater jackets have a high quality construction (PTFE layering), long service life, easy on and off capabilities with standard Hook and Loop fasteners, are Clean room compatible, and UL®, CE, and SEMI S2-93 compliant. 
  • Chemical Mechanical Planarization Systems
    EBARA presently offers two 300mm models (FREX300S2 and FREX300X3SC) as well as a newly re-designed 200mm CMP system (FREX200M). These systems incorporate the latest technologies into our dry in/dry out integrated clean CMP platforms....

  • EBARA presently offers two 300mm models (FREX300S2 and FREX300X3SC) as well as a newly re-designed 200mm CMP system (FREX200M).  These systems incorporate the latest technologies into our dry in/dry out integrated clean CMP platforms. The 200mm F-REX200M offers a two-head, two-platen design for greater process flexibility and increased throughput. The F-REX300S2 and F-REX300X3SC offers a four head, four platen with three step clean design allowing for customized process recipes with the demonstrated capability to reliably meet 7nm technology requirements.  EBARA’s platforms are designed to operate providing both development and production flexibility while increasing throughput required for creating the reputation as best in class production reliability and total cost of ownership.

    Ebara Technologies, Inc. (ETI) also offers Refurbished CMP systems and ability to support both the 200mm and the 300mm models.  All refurbished systems are supported by experienced and highly trained EBARA engineers to support  installation, process development, technical support, service support, training support, and ongoing parts support.

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LED/solid state lighting, MEMS, Other, Photovoltaic, Power Semiconductors, Semiconductor, Flexible and Printed Electronics-, Sensors


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