SPS-Europe B.V.

Midden Engweg 41
Putten,  NL-3882 TS

  • Booth: 560

Come by & meet us in booth #560

For more than 30 years, SPS offers quality products and services as a one-stop shopping point for the Front-End. We have developed our own spin coaters and successfully sold over 2000 units worldwide.

-           We have Product Demonstrations on our Booth #560         -

This year you will find on our booth #560:

K-patents - Semicon Process Refractometer
Prosys - Sapphire MegPie is a single-wafer Megasonic transducer
4PICO - MicroMaster and PicoMaster Direct Laser Writer Systems
POLOS - Spin Coaters 150 mm, 200 mm and 300 mm 
Saesol -  CMP Pad Conditioners and Back Grind Wheels


  • Sapphire MegPie single-wafer Megasonic transducer
    For cleaning and sonochemical processing....

  • It applies a uniform dose of acoustic energy to a rotating substrate. The MegPie will improve process efficiency and lower process time. It is easy to retrofit to your single-substrate processing tool.

    • Particle-neutral sapphire resonator – no particles added to the process
    • Patented crystal bond to the resonator
    • Patented RF connection to the crystal
    • Redundant internal RTD temperature monitoring
    • Available in 100mm to 450mm+
    • Custom sizes available
    • Sapphire resonator compatible with all processing chemistries
    • Uniform direct acoustic energy applied to the process
    • Increased process efficiency
    • Reduced process time
    • Reduced process chemistry usage
    • No moving parts to maintain
    • No consumables – works better than brushes

        For more information please visited our booth #560   

  • K-Patents Semicon Process Refractometer PR-33-S
    Monitors the fab chemicals' concentration in cleanroom environment and in the integrated process tools (blending, clean, etch, and CMP)...

  • The PR-33-S consists of an ultra-pure, modified PTFE flow cell body and an Ethernet cable that any standard PoE (Power-over-Ethernet) switch can use to transmit power to the sensor and data to a computer. The PR-33-S monitors chemical concentrations in real-time and provides an Ethernet output signal and immediate feedback, if the chemical is out of specifications. For example, low and high concentration alarms may be configured to control and increase bath life. The concentration is determined by making an optical measurement of the solution’s Refractive Index nD and temperature.

    The PR-33-S is mounted directly in-line with a flare or pillar fitting. The PR-33-S has a compact, metal-free construction and it only needs a small footprint area.

    Key Features:

    • PR-33-S is used for process control and monitoring.
    • Compact and mounted directly in-line. The measurement is not influenced by particles, bubbles or turbulent flow and impurities in the ppm range.
    • Provides a continuous Ethernet output signal; 4-20 mA outputs available as option.
    • Full measurement range Refractive Index nD 1.3200–1.5300, which corresponds to 0-100 % by weight. Optional range nD 1.2600–1.4700 for strong HF.
    • Typical accuracy R.I.+ 0.0002, which typically corresponds to 0.1% by weight, e.g. for HCl in water.
    • N.I.S.T. traceable calibration, verification with standard R.I. liquids and K-Patents documented procedure (ISO 9000).
    • Patented CORE-optics (US Patent No. US6067151): no drift, no re-calibration, no mechanical adjustments.
    • Remote panel via Ethernet for data-logging and remote operation.
    • The communication is built by the standard UDP/IP protocols.
    • Process temperature range: -20°C – 85°C (-4°F – 185°F).
    • Fast process temperature measurement by built-in Pt1000 and automatic digital temperature compensation.

        For more information please visited our booth #560   

  • CMP Pad Conditioners
    Provide lower cost of ownership with better process results. Our products have been tested and proven in production by major semiconductor manufactures in USA, Europe, Taiwan and Korea. ...

  • Characteristics
    We minimize diamond loss possibilities during the process by analyzing the pads and slurries as well as each individual disk prior to manyfacturing.

    • Excellent Diamond Retention
    • Longer Disk Life
    • Increased Pad Life
    • Significant Lowering of Micro Scratches Consistent Removal Rate
    • Special Proven Low ph Coatings

    CMP Processes
    We have the capability to meet the needs of each customer by porviding customized disks based on years of experience cooperating with major fabs and R&D centers

    • Oxide CMP : BPSG, TEOS, SC
    • Metal CMP : W, CU
    • STI, PGI etc.

    Availability of Our Products
    Our CMP disks are available in various production quantities, shapes and sizes for all CMP production platforms.

    • Applied Materials Mirra and Mirra - Mesa
    • Ebara  EPO-113, 222, 333
    • Strasbaugh DS-SP, 6ED
    • Speedfam / IPEC

        For more information please visited our booth #560   

 Additional Info

New Exhibitor:
New Products:
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Please indicate which industries/technologies your company serves
MEMS, Power Semiconductors, Semiconductor


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