Run-to-run growth rate stability is
often an issue for epitaxial reactors.
Since it is primarily affected by the
way silicon is controlled
and distributed it usually does not
greatly depend on reactor design.
LPE has developed a tool
to significantly improve
this key factor
(patent pending), known as
Our Bubbler has been widely tested
on our LPE reactor as well on other brands of reactors, on both
single-wafer and batch type systems.