The mobile high-performance leak detectors by Pfeiffer Vacuum are optimized for rapid pump down and short response times for large test objects.
The ASM 390 and ASM 392 are the perfect leak detection solutions adapted to the semiconductor and display industries as well as other demanding applications where rapid pump down and high sensitivity is key. Both units are fully Semi S2 compliant.
These leak detectors are fitted with a dry frictionless backing pump and a powerful high vacuum pump, making them the ideal tools for leak testing of various components in clean environments. Equipped with an additional turbopump, the ASM 392 will speed up your leak detection process to reduce downtime of your production equipment.

Ergonomic and highly maneuverable
ASM 390 and ASM 392 share the same platform and are uniquely ergonomic with a convenient size and height, a secondary handle in the front, a fully rotatable, removable display, an inlet in the front for easy connection to test ports and unrivaled maneuverability for access to all testing areas, even in tight spaces.

Smart and user-friendly
Thanks to a wide, clear color touch display panel, an integrated toolbox with modular compartments and storage space for vacuum bellows, you will be amazed how easy leak detection can be when you have all necessary accessories at the point of use.

A4 XN series dry pumps to address the most corrosive applications

Harsh duty processes in semiconductor production always provide new challenges for vacuum pumps. Based on the proven and energy efficient multi-stage Roots technology, the A4 XN series offers a wide range of four dry pump solutions designed for the most corrosive applications, with different pumping speed from 600 to 2,900 m3/h.

The A4 XN series is fully compatible with pumps from predecessor series & versions (H & X).

Advantages

• Highest corrosion resistance for increased lifetime thanks to Nickel coating technology
• High energy efficiency due to multi-stage Roots technology, high efficiency motors and limited use of electrical heaters
• Wide operating temperature range protects the pump against precursor cracking or condensable deposition

• High mean time before failures and low cost of ownership
• High particle tolerance increases tool uptime
• Extended monitoring functionalities for accurate control of pump operating conditions and idle mode capabilities
• Semi S2-0712 and UL 61010 compliant

The optimal solution for the most corrosive processes
Featuring all the technological advantages and benefits of A4 H & A4 X series, the A4 XN series has a nickel coating on all parts in contact with process gases for corrosion resistance. Compared to A4 H & A4 X models, the lifetime is drastically improved on very high corrosive application like poly Etch for example.

Airborne molecular contamination (AMC) in IC fabs is known as the major factor of yield loss. To control and understand where contamination comes from, Pfeiffer Vacuum now brings a unique solution to the semiconductor market to monitor clean rooms as well as EFEM (Equipment Front End Module).

Advantages

• Real-time compound measurement (acids, bases, organic compounds)
• Innovative software to manage sampling lines priority, quality check (QC) and alarms
• 96 samplings lines gathered onto one tool (up to eight analyzers)
• High throughput (analyzing and cleaning within three minutes)
• No cross-contamination from one sampling line to another

The AMPC gathers the most advanced analyzers to detect and quantify acids, bases and organic compounds in up to 96 locations in a fab thanks to an innovative and integrated valves design.

AMPC range includes two tools: AMPC S and AMPC L where external dimensions, number of lines and options are different.

Additionally, the AMPC Extension Frame provides 39 U of space for extra analyzers. It can be used for upgrades of existing AMPC units or added to new AMPC S and AMPC L units.

Data management and fab communication
The tool software allows the end users to set various alarms when the levels of contamination exceed defined thresholds.
All measurement results and tool parameters are stored in a database that can be transmitted to fabs’ communication protocols to provide customers with a real-time picture of the fab’s contamination levels.
The customer is also able to remotely access the tool to modify tool parameters if necessary.