HORIBA Instruments Inc.

430 Indio Way
Sunnyvale,  CA  94085

United States
http://www.horiba.com
  • Booth: 1529


Visit the global leader in process metrology and control

HORIBA is a global group of companies that provides analytical and measurement equipment in Semiconductor and other industries.  We are a global leader in process metrology and control and we are expanding our business operations by leveraging our advanced technological capabilities and global network.  Our Semiconductor product offering ranges from gas and liquid flow components to particle detectors for CMP and complex concentration monitoring equipment.  Visit our booth #1529 to see the latest in our application-based product development that supports the next generation of process requirements for Semiconductor manufacturing. Click here to learn more!


 Press Releases

  • PD-Xpadion is the latest generation of the HORIBA Particle Inspection product line. Based on an innovative modular platform design, PD Xpadion is the right tool to meet current and future needs of Mask & Pellicle inspection in the lithography and mask production processes. Fab automation, combined with a suite of HORIBA’s core technology, allow users to expand the PD Xpadion system to include not only particle inspection and detection, but also particle characterization by Raman analysis, pellicle film thickness and uniformity, and pellicle health monitoring tools.

    HORIBA has completely redesigned the user interface and software to enhance the usability, capability, and future expandability of the entire PD Xpadion platform. The software is capable of producing tremendous new insights into the reticle/pellicle analysis results, including, scattering intensity analysis, raw data pixel counts, particle size, and new layouts for viewing multiple particle images in a single view for post-process particle review. We’ve enhanced our process tuning capability by creating a software module for data re-processing without re-inspection. The re-processing module allows users to tune recipes and particle binning real-time, using the data from their reticle/pellicle measurement without the need to make adjustments and re-inspect the sample.

    Our core technology has been improved significantly through optimization of the PD Xpadion’s digital data processing and communication bus optimization. HORIBA’s legacy inspection products were built upon a mostly serial communication bus throughout the system. PD Xpadion now utilizes a new parallel communication bus to each subsystem which allows for much faster data transmission, easier troubleshooting for individual nodes in the system, and (most importantly) noise reduction in the signal processing chain throughout the platform. These enhancements allow us to significantly improve total system signal-to-noise ratio and especially improves particle detection signal noise.

    PD Xpadion is highly configurable and can be built for optical masks (glass, pattern, pellicle), blank mask inspection, or EUV masks/pellicles. HORIBA is proud to present a flexible inspection system which is ready to meet the needs of both legacy and next generation inspection requirements. Entrust your yield enhancement strategy and quality control to HORIBA’s PD Xpadion.


 Products

  • HORIBA PD Xpadion
    Inspection and Metrology platform designed by HORIBA to scan reticles/masks and pellicles for particles and/or defects....

  • HORIBA’s PD Xpadion System utilizes a patented laser-based scattering technique to detect particles on each reticle/mask surface. Systems are typically equipped with 2 optical systems for both upper and lower reticle and pellicle measurements. The optical system can be specified and utilized for blank mask inspection, pattern mask inspection, and EUV mask/pellicle inspection. System is designed to observe particles with a review microscope and automatically capture images and additionally output a defect size for each particle to a customer-specified file format. Typical throughput (depending on system configuration and recipe) for measuring 3 surfaces (pattern, glass, and pellicle) is less than 10 minutes including load/unload. Systems can be configured with single-case reticle handling, or combined with an EFEM for multi-case type reticle handling. Systems can be configured with optional 2D barcode readers, QR code readers, and RFID readers as well as optional GEM/SECS and SEMI Compliant OHT compatibility.

    The PD Xpadion platform was designed to accommodate expansion of the system to include additional sensors which may be utilized for particle removal, particle characterization, pellicle health, pellicle uniformity, etc. HORIBA utilizes our own RP-1 particle removal system and our market-leading Raman spectroscopy and Ellipsometry technology to incorporate these additional functions to the PD Xpadion platform.

  • Centrifugal Nanoparticle Analyzer
    Partica Centrifuge - High resolution particle size distribution measurement by centrifugation....

    • Realizing precision particle size distribution measurement for undiluted to dilute samples.
    • Small amounts of foreign particle or agglomeration can be captured
    • Features stable measurement even for the long time measurements
  • EV 2.0 Series
    Endpoint / Chamber Health Monitor based on Optical Emission Spectroscopy and MWL Interferometry....

  • To address new requirements in Semiconductor, lighting devices, automotive components, flat panels, MEMS sensors, memory chips, and logic electronics processed in the industry using dry etch, cleaning and (PE)CVD, HORIBA has introduced a unique generation of sensor dedicated to Advanced Endpoint ControlFault Detection and Chamber Health Monitoring.

    EV 2.0 is a configurable high-performance spectrograph, customized for a variety of semiconductor OEMs and end-user applications, including Process Engineering with automatic Endpoint Recipe creation, and on-board processing performing full endpoint and process quality management

    Depending on accessories, EV 2.0 is dedicated to Optical Emission Spectroscopy (OES) or Multiwavelength Interferometry (INT) Endpoint process real-time Monitoring, on single chamber or cluster tool configuration.


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