TOFWERK

Confidently monitor a broad range of volatile organic compounds (VOCs) with a single instrument. 

The Vocus VOC Monitor provides sensitive and simultaneous measurements for a large variety of VOCs, instantaneously, reported in real time. 

Features

• Fast, real-time monitoring of dynamic processes or high-throughput screening
• Highly sensitive quantification for a wide range of VOCs
• pptV limits of detection
• High resolution to ensure accurate compound identification
• Mobile, point-of-interest measurements, or multi-port valve connectivity, requiring no sample preparation

Typical AMC monitoring can be done with PTR reagent ions, however, for other critical AMCs, reagent ion switching can be used to expand compound coverage. The Vocus VOC Monitor samples ambient air in a fab environment to observe potential AMC risk. The example below demonstrates reagent ion switching a minute intervals. 

Enhancement of the measurement shows the reagent ions used in second intervals. Gray represents NH4+ ionization and yellow represents O2+ ionization. 

Limits of Detection

System Specifications

Ensure a contaminant-free fab with the Vocus ABC Monitor.

Traditional AMC monitoring techniques often require a suite of different instrumentation to provide adequate quantification, often with poor time resolution. 

Combining multiple chemical ionization techniques within one mass analyzer - the Vocus ABC Monitor provides sensitive and simultaneous measurements for each AMC category - acids, bases, condensables and many VOCs - instantaneously, in real time, without any sample preparation or handling. 

Features

• Ultra-fast measurements of dynamic process monitoring or high-throughput screening
• Simultaneous detection of multiple key AMC classes with pptV LODs
• Customized database for common AMCs
• Eliminate ionization induced fragmentation for unsured accuracy
• Mobile measurements, or manifold connectivity, without sample preparation

In the example below, a variety of molecular contaminants from 

• Robust, real-time monitoring for:
  • Research and development
  • Production environments related to etch, deposition, and lithography processes
• Plasma diagnostics based on traces of plasma species
• High dynamic range to monitor abundant and trace compounds
• Sub-monolayer sensitivity for accurate end-point detection
• Detection of etch rate changes and fluctuations due to malfunction or instabilities
• Accurate spectral assignment for complex and rich mass spectra