JEOL USA, Inc.

11 Dearborn Rd
Peabody,  MA  01960

United States
http://www.jeolusa.com
  • Booth: 1441

JEOL USA

JEOL provides leading-edge electron microscopy and e-beam lithography solutions for 200/300mm, nano-fabrication processes and research.

Microscopy Tools

JEOL’s microscopy expertise spans more than 70 years. As the leading global supplier, we offer a full suite of Scanning Electron Microscopes (SEM), Transmission Electron Microscopes (TEM), and sample preparation tools. JEOL’s SEMs and TEMs feature advanced automation and capabilities for high throughput, high resolution imaging and analysis. JEOL offers both focused (FIB) and broad ion beam milling systems. Our Cross Section Polisher features air-isolated transfer and cooling for sensitive samples.

Lithography Tools

As the industry leader in direct write e-beam lithography, JEOL’s latest generation of tools will take you through several next-generation designs. JEOL has more than 50 years of experience in e-beam and mask writing tools.

Service and Support

JEOL USA is a wholly-owned subsidiary that supports the Americas with regional service offices and headquarters in the Boston area.


 Press Releases

  • A new Scanning Electron Microscope (SEM) from JEOL answers the need for faster and easier acquisition of both SEM images and EDS data analysis, especially suited for repetitive operations and quality control.

    JEOL, the global leader in the development of cutting-edge Electron Microscopes for materials characterization and analysis, introduces its latest SEM, the JSM-IT510. This new Scanning Electron Microscope features productivity enhancing automation, including “Simple SEM” automated imaging, automated montaging (both image and EDS map) and live EDS analysis (spectrum and map).

    The IT510 is the successor to the popular JEOL IT500 InTouchScope SEM, with its large sample chamber and tungsten or LaB6 filament. The IT510 features JEOL Intelligent Technology that enables seamless navigation from optical to SEM imaging, Live EDS and 3D analysis, and auto functions from alignment to focus for fast, clear, and sharp images.

    The user of the new IT510 has several productivity-enhancing new features:

    The new Simple SEM function automates image collection at multiple locations on a sample, and sets the various conditions required, including magnification and settings. Simple SEM simplifies and automates workflow for routine tasks.

    A new “Live 3D” function constructs 3D images of the sample surface during observation showing surface shape and depth information in real time.

    Signal Depth automated function calculates the X-ray generation depth to support understanding of the analytical spatial resolution within a specimen under the conditions set. Useful when conducting elemental analysis.

    A new Low-vacuum Hybrid Secondary Electron Detector collects both electron and photon signals, providing an image with high S/N and enhanced topographic information. This detector also supports photon imaging with specimens that give a cathodoluminescence response.

    Live Mapping displays the elemental map simultaneously with SEM imaging, made possible by a new Integrated SEM and Energy Dispersive X-ray Spectrometer (EDS) System. The user can switch seamlessly between the live map view and spectrum view during SEM image observation. Then they can overlay the element maps of interest on the live SEM image for enhancing understanding of element distribution within a specimen.

    Zeromag software seamlessly navigates to the area of interest from an optical image of a larger general area of the sample. The user is never lost and can easily navigate to the desired observation area by simply clicking on the optical image.

    The JEOL IT510 is designed for unprecedented ease-of-use with advanced SEM technology in a compact platform. This smart-flexible-powerful Scanning Electron Microscope delivers the highest level of intelligent technology with built-in automation for the most versatile analytical SEM available today.


 Products

  • JBX-8100F
    Direct Write E-Beam Lithography System Designed for higher throughput and lower operating costs, this spot beam system writes ultrafine patterns at a faster rate of speed while minimizing idle time....

  • JBX-8100FS Spot Beam Lithography System Features:

    • Small footprint
      The area required for the standard system is 4.9 m (W) x 3.7 m (D) x 2.6 m (H), much smaller than the conventional systems.
    • Low power consumption
      Power needed for normal operation is approximately 3 kVA, reduced to 1/3 of the conventional systems.
    • High throughput
      The system has two exposure modes, high resolution and high throughput modes, supporting different types of patterning from ultra fine processing to small to mid size production. It has minimized the idle time during exposure while increasing the maximum scanning speed by 1.25 to 2.5 times to 125 MHz (the world’s highest level) for high speed writing.
    • Version
      The JBX-8100FS is available in 2 versions: G1 (entry model) and G2 (full option model). Optional accessories can be added to the G1 model as needed.
    • New Functions
      An optional optical microscope is available to enable examination of patterns on the sample without exposing resist to light. A signal tower is provided as standard for visual monitoring of system operation.
    • Laser positioning resolution
      Stage positions are measured and controlled in 0.6 nm steps as standard, and in 0.15 nm steps with an optional upgrade.
    • System control
      Versatile Linux® operating system combined with a new graphic user interface provides ease in operation. The data preparation program supports both Linux® and Windows®.

    http://bit.ly/2BMAAAq

  • JSM-IT800 FE Scanning Electron Microscope
    The IT800 series of Schottky Field Emission SEMs with ultrahigh resolution enables seamless acquisition of data from observation to elemental analysis and subsequent reporting....

  • The IT800SHL is JEOL’s flagship FE SEM with up to 2,000,000X magnification and an accelerating voltage range of 0.01 to 30kV, making it possible to acquire stunning details of nanostructures and comprehensive analysis.  This highly versatile, easy-to-use field emission SEM offers the next level of analytical intelligence in FE-SEM. 

    The IT800 series is designed to streamline operation and workflow efficiency with elegant functionality, ultrahigh resolution and powerful software, enabling seamless acquisition of data from observation to elemental analysis and subsequent reporting.

  • JEM-ACE200F High Throughput S/TEM
    An automated, high-throughput S/TEM designed to meet the unique demands of semiconductor device development and manufacturing....

  • The JEM-ACE200F High Throughput Analytical Electron Microscope delivers fast, stable, and highly-resolved data acquisition for morphological observation, critical dimension measurements and elemental analysis. The JEM-ACE200F can utilize pre-programmed recipes for wholly unattended operation. Based on the industry-standard ARM200F and F2 JEOL instruments, the ACE provides superb stability and resolution.

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