Picosun Oy

Picosun USA, LLC
1651 N. Collins Blvd. Suite 224
Richardson,  TX  75080

United States
https://www.picosun.com/
  • Booth: 1832


Coating the future of technology today - with ALD

Picosun is the leading supplier of ALD (Atomic Layer Deposition) thin film coating technology for semiconductor and other industries.

PICOSUN™ ALD equipment portfolio ranges from fully automated, SEMI compliant batch and cluster systems for high volume manufacturing to smaller scale R&D and pre-pilot production tools. Production-proven coating solutions for IC, MEMS, LED, sensor, and 3D component processing are mastered with world-class process quality, the leading equipment design, and the most comprehensive process support and customer care.

Contact Picosun to harness the full power of ALD!

www.picosun.com

info@picosun.com

 Press Releases

  • Picosun Group and Shincron Co., Ltd. have joined forces for development and commercialization of Atomic Layer Deposition (ALD) for optical coatings. ALD technology provides uniform and conformal coatings to the even most challenging structures and is therefore well suited for high-end optical applications.

    The R&D teams from both companies have worked together to tailor existing ALD processes optimizing them for the use in optical applications. In addition to standard ALD optical films, ALD magnesium fluoride (MgF2) has been researched and is now available for commercial use for the first time. So far, ALD MgF2 processes have been only presented in academic research by universities and science institutes. MgF2 is a desired material in optical applications due to its low refractive index at visible light and high transmittance in FUV optical region. It can be used as a single layer or as part of an optical stack combining low and high refractive index materials. It has also other features, such as barrier properties and high chemical stability, which bring big advantages in some applications.

    The collaboration agreement was first signed in 2019 including the appointment of Shincron as Picosun’s sales representative and ALD product distributor in Japan. The collaboration was extended with Joint Development Agreement (JDA) in 2020 with the aim to develop novel and advanced ALD coatings for optical applications.

    “We are very excited about the collaboration. The teamwork has been fruitful, and the results obtained now are excellent. We see optical coatings as one of the emerging ALD applications and believe in strong growth in this market”, says Jussi Rautee, CEO of Picosun.

    “We are happy to add ALD technology to our offering. This way we can increase our services for our customers. We have set up a demo capability for ALD optical coatings and Japanese optical companies have shown high interest for this process”, says Masaya Narita, CEO of Shincron.

    Read more: picosun.com/optics/magnesiumfluoride

  • PICOSUN® Morpher has continued to demonstrate excellent batch process results in the latest acceptance runs the company has performed for its customers in the global semiconductor industry. Excellent uniformities (<1% 1sigma) and single-digit particle levels have been reached at a number of acceptance runs with different film materials such as Al2O3 and SiO2.

    PICOSUN® Morpher was launched in 2019 for up to the 200 mm wafer markets. The tool’s strength is the adaptability to the changing needs of different business verticals, from corporate R&D to production and foundry manufacturing. It enables fully automatic and high throughput production of for example MEMS, sensors, LEDs, lasers, power electronics, optics and 5G components.

    “The market showed great interest towards PICOSUN® Morpher after the launch and it has now become a leading product for the sub-300 mm production market. We have delivered PICOSUN® Morpher to a variety type of customers, the latest including world leading manufacturers that use the tool both for pilot and high-volume manufacturing of integrated circuits”, states Juhana Kostamo, VP, Industrial Business Area of Picosun Group.

    Earlier this year Picosun Group informed about record-breaking batch film quality results with PICOSUN® Sprinter, the Picosun new generation tool for 300 mm wafer markets.

  • Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.

    ams OSRAM has invested in a fully automated PICOSUN® Morpher production cluster, which can deposit multiple materials on a batch of wafers even during the same process run. The flexibility and process variety of the PICOSUN® Morpher system is a key advantage, which enables volume production as well as the testing of new processes for R&D of future products.

    Picosun Group and ams OSRAM have collaborated in a public funded project FLINGO (m-era.net project) to develop new ALD materials and processes to improve the characteristics of LEDs, such as efficiency and durability. The collaboration between the parties will continue after the ALD system delivery with activities to further expand the use of ALD in optoelectronic semiconductor processing.

    “We have been working with Picosun since 2010 and now with this investment we can bring our collaboration to the next level. We are very excited to have the PICOSUN™ Morpher F cluster platform installed in our cleanroom”, states Dr. Sebastian Taeger, at ams OSRAM.

    “The optical semiconductor market is one focus area of Picosun today. It is a fast-growing market where we have a strong presence with our tailored solutions for compound semiconductor-based devices. We have had excellent collaboration with the ams OSRAM technical team during project FLINGO and during the system specification stage. The expertise from both companies has resulted in optimized ALD solutions to boost the performance of the customer’s products.”, continues Dr. Christoph Hossbach, General Manager of Picosun Europe GmbH.

 Products

  • PICOSUN® Sprinter
    The PICOSUN® Sprinter ALD system is designed to disrupt batch ALD production in 300 mm manufacturing lines in the semiconductor (e.g. emerging memory, transistor, capacitor), display, and IoT component industries....

    • The core of the Sprinter is its disruptively designed reaction chamber, where fully laminar precursor flows ensure perfect ALD deposition with no parasitic CVD growth. This minimizes the need for system maintenance.

    Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with lower thermal budget, so it is suitable also for temperature-sensitive devices.

    Sprinter combines very fast process times with smaller batch sizes than in vertical furnaces, which allows greater production flexibility and minimized risk without sacrificing throughput.

    The tool has also demonstrated record-breaking batch film quality.

    The standard Picosun Sprinter cluster configuration consists of two ALD modules, a central wafer-handling robot with pre-heating and cooling chambers, and an EFEM station to load/unload wafers from/to the FOUPs. Sprinter can also be purchased as a standalone module ready to be integrated into an existing manufacturing line or cluster.

  • PICOSUN® Morpher
    PICOSUN® Morpher is designed to disrupt the up to 200 mm wafer industries in Beyond and More than Moore technologies. It enables fully automatic, high throughput production of MEMS, sensors, LEDs, lasers, power electronics, optics, and 5G components....

    • The PICOSUN® Morpher adapts to the changing needs of your industry and the requirements of your customers, on all business verticals from corporate R&D to production and foundry manufacturing. The leading versatility in substrate materials, substrate and batch size, and the wide process range make PICOSUN® Morpher truly a transformable, all-inclusive manufacturing facility to keep you spearheading your industry.

    The PICOSUN® Morpher is designed for fully automated handling of wafer batches in combination of industry standard single wafer vacuum cluster platforms. Revolutionary, patented wafer batch flipping mechanism enables integration of the system with semiconductor manufacturing lines where most of the processing takes place in horizontal geometry, and the SEMI S2/S8 certification ensures that the system is compatible with the strictest standards of the industry.

Categories

205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 207 Process Equipment
  • Deposition; (CVD, PVD, ALD, Plating)
    • 300 Packaging and Assembly Materials
  • Thin Film; Dielectric Film Materials
    • 301 Chemicals & Solids
  • Surface protection material; coatings
    • 305 Nanotechnology Materials
  • Nanotechnology Materials

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