Vistec Electron Beam GmbH

Ilmstrasse 4
Jena,  D-07743

Germany
http://www.vistec-semi.com
  • Booth: 1051


We understand E-BEAM.

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.

The company headquarters are located in Jena, Germany, with office and manufacturing facilities including 740 m² cleanroom space for assembly and qualification. Vistec Electron Beam also maintains service and support centers in Western Europe, Asia and in the US.

 Products

  • Vistec SB3050-2
    The Vistec SB3050-2 with Cell Projection option is our commitment to semiconductor manufacturing professionals. It features Variable Shape Beam (VSB) technology with vector scan & continuously moving stage principles for throughput optimization....

    • KEY FEATURES

    • 50keV high-resolution electron optics with 1nm writing/address grid
    • 310x310mm stage travel range to ensure full 300mm wafer exposure capability
    • High throughput achieved by the "write-on-the-fly" principle combined with Flexible Stage Speed (FSS)
    • State of the art fully automatic substrate handling with mini environment to satisfy the requirements
      of most advanced resist technologies
    • Wafer Mix & Match with optical lithography supported by production compatible correction methods
    • Integrated monitoring software for all critical process parameters
    • High speed data processing allows fast data generation including flexible Proximity Effect Correction with distributed computing
    • Small clean room footprint < 27m² (SB3050)
    • Cell Projection option for combined use with VSB principle for further throughput improvement
  • Vistec SB254
    The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands....

    • KEY FEATURES

    To meet the specific requirements of our customers the following features are optionally available:

    • Various substrate sizes and types supported by fully automated substrate handling incl. substrate pre-alignment
    • Multipass writing
    • MDSP (Mark Detection Software Package) incl. image field metric
    • Layout data preparation station covering up to 256 CPU cores for:
      • fracturing
      • plus additional Proximity Effect Correction (PROXECCO) and fogging correction options
    • Graphical User Interface (GUI) compliant to SEMI E95
    • Address grid down to 1nm

    The Vistec SB254 This electron-beam writer represents the evolutionary development of the successful and field-proven Vistec SB250 series. The Vistec SB254 with cell projection option for combined use with VSB principle enables further throughput improvement and a resolution below 20nm (HSQ).

Categories

205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 603 Simulation, Analysis; Modeling Software
  • Mask Making software & simulation
  • Simulation; Characterization; Verification Software
    • 700 Manufacturing Services
  • Calibration & Reference Standards
  • Lithography; Patterning service

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