Nikon leverages over 100 years of optical design and manufacturing expertise to deliver OPTISTATION-3000 series inspection systems to meet the most challenging post-develop and post-etch inspection requirements of today‘s IC makers. OPTISTATION-3000 series products are available to satisfy a variety of fab configurations and wafer handling requirements. OPTISTATION-3000 series systems incorporate renowned Nikon CFI60-2 objectives, which produce excellent images with high contrast and reduced flare. The OST systems also provide brightfield and darkfield micro inspection modes, and OST-3000 series systems enable micro inspection across the total magnification range of 25x to 1,500x. Surface Macro, center wafer backside Macro, and perimeter wafer backside Macro inspection functions are all possible with OST-3000 series systems.
Nikon also offers Automatic Inspection Systems that provide industry-leading macro inspection accuracy as well as expanded inspection capabilities. Nikon recently announced the next-generation AMI-5700 system, which supports sophisticated measurement capabilities in addition to inspection. The newly announced AMI-5700 provides industry-leading inspection sensitivity with capabilities to detect particles and scratches as small as 5 μm using add-on scattering inspection technology. It also detects a variety of pattern defocus conditions that are typically beyond the capabilities of traditional macro inspection tools. The industry-leading AMI-5700 system can be equipped with an innovative high-speed measurement function that supports CD, film thickness and focus measurements at speeds surpassing those of other methods. This enables the AMI-5700 to deliver superior throughput of 180 wafers/hour even when performing diffraction and scattering batch inspection of the entire wafer. The innovative AMI-5700 not only inspects, but also measures wafers and detects defects.