Buhler Inc.

A highly sophisticated machine design and precision manufacturing produce the ultrahigh vacuum pressure you need to deliver perfect stoichiometric film quality.

While the sputter source and deposition process provide excellent stability, the mechanical design of the NESSY series is based on minimized tolerances. This enables NESSY to bridge the gap to subatomic uniformity values necessary in, for example, EUV and other challenging optics applications.

The substrate holder has a double planetary rotation system designed to manage the substrate movement you need for highly precise uniformity. The high-speed direct substrate rotation works in combination with a low-velocity rotation around the chamber with programmable speed profiles. This allows NESSY to coat a wide range of substrate geometries to match your precise application.

A user-friendly software provides analysis and visualization of measured data from different sources to prepare a simulation for the machining process. The fully automated machine doesn't require any human monitoring and you can customize the graphical user interface to reflect your application.

The IBF measuring system uses low-coherence technology to determine the etch-rate profile of your ion source with highest precision. It includes an interchangeable sample holder for a wide variety of materials. Multiple measurements can be made with a single measuring head.

You can change the aperture for the ion beam source during operation (inside the vacuum chamber), with up to five diaphragms, measuring range from 0.5 mm to 20 mm in diameter.