INFICON

Quantus HP100 has a microplasma sensor cell (MSC) in the analyzer. It can generate a localized microplasma that emits light representing the gas species, so Quantus HP100 does not require light emission from the chamber to be monitored. This greatly unleashes the power of OES technology and makes it compatible with “dark” chambers as well as other locations on a semiconductor tool such as, forelines and exhaust lines, etc.

Key Applications for Quantus HP100 includes: REAL-TIME LEAK DETECTION, ENDPOINT DETECTION, GENERAL GAS ANALYSIS WITHOUT PUMPS

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 FabGuard® identifies anomalous subfab components and links analysis of those components to process-based FDC.

The FabGuard system uses real-time data to manage and monitor subfab/facilities components to minimize usage of power and consumables, lowering costs and maximizing your green footprint.

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INFICON knows semiconductor and display customers have unique needs, and the latest revision of the Transpector APX allows for more flexibility to meet specific application requirements, while maintaining industry leading measurement speed and sensitivity. Transpector APX is the ideal RGA process monitor for semiconductor processes such as ALD, CVD, PVD, and etch.

Modern semiconductor processes are more demanding than ever. The increasingly competitive semi and display manufacturing landscape drives the constant need for maximizing throughput and yield. Higher performing semiconductors require increased manufacturing complexity, resulting in higher costs. Minimizing scrap by increasing cleanliness standards, tool qualification, and process monitoring is essential for wafer and panel production. Designed to provide premier trace gas analysis for semiconductor applications, Transpector APX is the choice instrument for monitoring advanced processes such as ALD and HDP CVD. Atomic layer processes require depositing extremely thin and uniform films. Process optimization requires precise control over precursor chemical doses. With industry leading measurement speed and sensitivity, the enhanced Transpector APX can monitor reaction by products to confirm process continuity and identify any unwanted variance. In addition to being the fastest RGA process monitor available, Transpector APX also delivers maximum uptime due to an array of innovative inlet and ion source options selectable based on the process conditions. The next generation Transpector APX inlet systems are designed to survive process chemistries prone to particle or coating generation like ALD or PECVD. This allows for continuous monitoring to capture data points at all the critical process steps. In addition simplified and HexBlock inlet options are available with INFICON proprietary coating for resistance to corrosive gases, essential for chamber clean endpoint monitoring applications.