Beijing Grish Hitech Co., Ltd.

Beijing,  China
https://grish.com
  • Booth: 6149

Welcome to GRISH and find your tailored polishing solutions.

Overview

Beijing Grish Hitech Co., Ltd. is a manufacturer of ultra-fine polishing abrasives for more than 20 years, and we are dedicated to offering tailored polishing solutions to customers worldwide.

Our main products are lapping films, micro-finishing film rolls, polishing powder, polishing slurry, polishing machines, and new abrasives, which are widely used in Semiconductor, Optical Communications, LED, Automobile, LCD, Electronics, Micromotors, Dental and other industries. At present, our products have been exported to dozens of countries, such as Germany, the United States, Japan, South Korea, the United Kingdom, India and so on.

Grish has always paid close attention to technological innovation, having 50 domestic and foreign invention patents. We are responsible for and participate in the compilation of 5 industry standards, with ISO9001:2008, ISO14001:2004, and OHSAS 18001:2007 registered so that we can satisfy various evaluation systems for global customers, and meet their relevant requirements.

As we are constantly innovating and developing new abrasives, you can find your one-stop polishing solution at GRISH.

  Press Releases

  • Beijing Grish Hitech Co., Ltd. is an experienced manufacturer specializing in the R&D, production and sales of ultra-fine abrasives, technology and related equipment. Founded in June 2001, the HQ is in Haidian, Beijing, China.

    In Semiconductor polishing, we have diamond polishing slurry, CMP polishing slurry, and polishing pads to provide a complete solution.

    Feel free to contact us for technical communication and sample testing, at grish@grish.com

  Products

  • Polycrystalline Diamond slurry (PCD slurry)
    Grish polycrystalline diamond slurry is formulated by adding PCD powder into water oil-soluble carrier liquid through scientific proportioning, which can significantly improve polishing efficiency....

    • 1. Manufacture Price Abrasives 

    PCD powders are produced by ourselves, synthesized by explosive method, the powder self-sharpening is good, wear resistance is high, and capacity is controllable.

    2. Customized Formula

    We can customize the special formula to meet the customer’s grinding and polishing needs.

    3. Stable Cut Rate and Excellent Finish

    Special formula with good dispersion and high removal rates, you will get fewer scratches and consistent finish surfaces.

  • CMP Slurry
    Grish CMP slurry is mainly based on colloids. The formula made through scientific proportioning can ensure the stability of pH value during the polishing process, thereby ensuring the stability of the polishing rate and saving time....

    • 1. Precise Polishing Quality

    Our CMP Slurries have uniform spherical SiO2 particles, which can achieve better Ra and TTV value.

    2. Higher Removal Rate

    Chemically stable under the chemical mechanical polishing and can achieve an excellent removal rate.

    3. Long Life

    CMP slurry can be recycled many times while the polishing performance is consistent.

Categories

1 FLEX
  • Materials
  • Tools & Equipment
    • 200 Packaging and Assembly Equipment
  • Backgrind; Slicing; Lapping; Polishing Equipment
    • 207 Process Equipment
  • Chemical Mechanical Polishing
    • 400 Components, Parts & Accessories
  • Sealants; Adhesives; Finishes
    • 700 Manufacturing Services
  • Sawing; Lapping; Grinding; Polishing Service
    • 701 Manufacturing Services or Consulting
  • Manufacturing Process Support and Development

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