Process Insights

Our APIMS is designed for reliable and repeatable low parts-per-trillion detection limits for contamination control in Ultra-High Purity (UHP) gases used in semiconductor and other high-tech industrial applications. Contamination is costly, and for more than 20 years, APIMS has been the research and industrial standard for on-line detection of low-level components of gas mixtures. Our VeraSpec APIMS utilizes a 19mm, tri-filter quadrupole mass filter in semiconductor gas analysis for the very best performance, reliability, and uptime.

Benefits:

Real-time monitoring: Provides real-time monitoring of process gas streams, which is critical for process control in the semiconductor industry. This allows for rapid adjustments to be made to the process parameters to ensure consistent quality and yield.

High sensitivity: Capable of detecting trace levels of impurities and contaminants in the process gas streams, making it an ideal tool for identifying and quantifying impurities that can affect the performance of semiconductor devices.

Versatility: Can be used for a wide range of applications in the semiconductor industry, including monitoring of gas purity, analysis of chemical processes, and detection of defects in materials.

Easy to use: Easy to operate and requires minimal maintenance, making it a cost-effective solution for the semiconductor industry.

Improved product quality: By detecting impurities and contaminants in the process gas streams, the APIMS can help improve the quality of the semiconductor products, leading to higher yields and better performance.

Our new TIGER OPTICS™ Halo Max QCL™ allows dramatic decreases in detection limits for certain molecules, such as CO.  Introducing the Halo Max QCL CO for ppt-level carbon monoxide detection offers exceptional speed and further improved usability in an all-inclusive and robust package. The analyzer is fast to install, offers continuous, real-time detection, and is easy to use and effortless to maintain, with built-in zero verification and zero drift.  The Halo Max QCL CO perfectly complement our Halo KA Max series (for H2O, NH3 and CH4), the Halo OK (for O2) and our other QCL-based analyzer, the Halo Max QCL CO2 to utilize the advantages of CRDS for detection of a large variety of critical trace impurities.

Our fi rst analyzer series based on Quantum Cascade Laser Cavity Ring-Down Spectroscopy (QCL-CRDS), the HALO Max QCL offers:
• Parts-per-trillion (ppt) detection capability for carbon monoxide (CO) and carbon dioxide (CO2)in UHP bulk gases
• Incorporates mid-infrared QCL technology to achieve the ultimate sensitivity
• Absolute measurement (freedom from calibration)
• Excellent speed of response at ppb levels and below
• Continuous measurement – no batch processing typical with GCs
• Robust design & maximum ease of use

Our QuickTOCultra Total Organic Carbon (TOC) analyzer is used for the measurement of Total Organic Carbon (TOC) levels in ultra-pure water (UPW). Ultra-pure water is used extensively in the semiconductor industry for cleaning and rinsing processes during the production of microchips and other semiconductor devices.  The QuickTOCultra is a water analyzer that measures total organic carbon (TOC) in wastewater, process water, and ultra-pure water applications. 

Our QuickTOCultra Total Organic Carbon (TOC) analyzer is used for measuring the concentration of organic carbon in semiconductor wastewater. The QuickTOCultra uses a process known as high-temperature combustion to oxidize the organic carbon in the wastewater sample and produce CO2, which is then measured using a non-dispersive infrared (NDIR) detector.

Our QuickTOCtrace water quality analyzer is designed to monitor total organic carbon (TOC) levels in ultra-pure water. The analyzer uses a unique and highly sensitive technique known as ‘chemiluminescence’ to measure TOC levels in water samples