Vistec Electron Beam GmbH

Jena,  Germany
http://www.vistec-semi.com
  • Booth: 944

We understand E-BEAM.

Overview

As a long-standing equipment supplier, Vistec Electron Beam GmbH, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for industrial and advanced research applications, such as electron-beam direct write in semiconductor manufacturing, including compound semiconductor, direct write mask making as well as photonics and several new emerging markets.

Efficient data processing & extended exposure strategies open up new applications, especially in the field of AR/VR.

Vistec’s technology features automated handling, as well as high flexibility, writing accuracy and productivity and therefore is suitable for prototyping and low volume production.

In addition to its production facility in Germany, Vistec maintains service & support centers in Asia Pacific, USA and Europe.

  Products

  • Vistec SB254
    Vistec SB254 The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands....

    • KEY FEATURES

    To meet the specific requirements of our customers the following features are optionally available:

    • Various substrate sizes and types supported by fully automated substrate handling incl. substrate pre-alignment
    • Multipass writing
    • MDSP (Mark Detection Software Package) incl. image field metric
    • Layout data preparation station covering up to 256 CPU cores for:
      • fracturing
      • plus additional Proximity Effect Correction (PROXECCO) and fogging correction options
    • Graphical User Interface (GUI) compliant to SEMI E95
    • Address grid down to 1nm

    The Vistec SB254 This electron-beam writer represents the evolutionary development of the successful and field-proven Vistec SB250 series. The Vistec SB254 with cell projection option for combined use with VSB principle enables further throughput improvement and a resolution below 20nm (HSQ).

    Check out more information here: https://www.vistec-semi.com/products-and-services/electron-beam-system

  • Vistec SB3050-2
    The Vistec SB3050-2 with Cell Projection option is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning, it features Variable Shape Beam (VSB) for throughput optimization....

    • KEY FEATURES

    • 50keV high-resolution electron optics with 1nm writing/address grid
    • 310x310mm stage travel range to ensure full 300mm wafer exposure capability
    • High throughput achieved by the "write-on-the-fly" principle combined with Flexible Stage Speed (FSS)
    • State of the art fully automatic substrate handling with mini environment to satisfy the requirements
      of most advanced resist technologies
    • Wafer Mix & Match with optical lithography supported by production compatible correction methods
    • Integrated monitoring software for all critical process parameters
    • High speed data processing allows fast data generation including flexible Proximity Effect Correction with distributed computing
    • Small clean room footprint < 27m² (SB3050)
    • Cell Projection option for combined use with VSB principle for further throughput improvement

    Check out for more information: https://www.vistec-semi.com/products-and-services/electron-beam-system

Categories

205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 603 Simulation, Analysis; Modeling Software
  • Mask Making software & simulation
  • Simulation; Characterization; Verification Software
    • 700 Manufacturing Services
  • Calibration & Reference Standards
  • Lithography; Patterning service

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