Advanced Energy

Denver,  CO 
United States
http://www.advancedenergy.com
  • Booth: 939

Advancing the Angstrom Era: Visit AE at booth 939

Overview

Advanced Energy® (AE®) has devoted more than four decades to perfecting power—enabling design breakthroughs and driving growth for leading semiconductor and industrial customers. AE is a market leader in power delivery, control solutions and temperature measurement for critical etching, deposition, inspection, implantation and annealing processes. 

Anticipating Customer Needs: Thanks to AE's platform architecture and innovative semiconductor manufacturing solutions, AE develop strategic partnerships, anticipates application needs and rapidly designs products and solutions for specific requirements

We Power the Platform: Delivering vast feature sets and reliable performance, AE’s system and embedded power solutions are the foundation of the next generation of semiconductor manufacturing platforms.

We Power the Process: As the DC and RF process power leader for the past 40 years, AE is involved in the manufacture of chips in fabs worldwide. AE’s expanded semiconductor portfolio now includes new power products as well as accurate and repeatable sensor solutions to meet customers’ power and measurement needs.

  Products

  • eVerest(TM) RF Power Delivery System
    eVerest's configurable multi-level pulsing enables instantaneous or user-defined transition timing. High-speed, high-accuracy model-based frequency tuning with wide frequency sweep range provides greater process stability and control....

    • eVerest’s configurable multi-level pulsing enables instantaneous or user-defined transition timing. Additionally, high-speed, high-accuracy model-based frequency tuning with wide frequency sweep range provides greater process stability and control. These capabilities, plus faster setpoint response, controlled overshoot at the beginning of pulsing states, and sophisticated PowerInsight by Advanced Energy™ IoT intelligence empower process innovation for the next technology node.
  • eVoS ME Bias Solution
    Direct control of wafer-surface voltage and ion energy distribution (IED) empowers process engineers to optimize bias performance for specific process results, ensuring sensitive feature formation....

    • Shrinking chip dimensions and high-aspect-ratio structures demand exacting control of ion energy. With the eVoS™ platform, AE introduces a paradigm shift in bias technology. By maximizing the ability to tailor ion energy, eVoS enables precise command of etch and deposition geometries at very small dimensions. Direct control of wafer-surface voltage and ion energy distribution (IED) empowers process engineers to optimize bias performance for specific process results, ensuring sensitive feature formation. In addition, fast digital metrology and novel control algorithms enable the production of narrower IEDs compared to alternative technologies. These capabilities change what’s possible in plasma processing.

Categories

203 Inspection & Measurement Products
  • Fiber Optic Inspection Instruments
  • Metrology; Topology; Nanotopography; Flatness; Cryst.Orient.
  • Thermal Sensing, Measurement, Analysis
    • 207 Process Equipment
  • Deposition; (CVD, PVD, ALD, Plating)
  • Deposition; PVD; Sputtering; Evaporation Equipment
  • Etching; Stripping; Ashing - Dry and Wet Equipment
  • Ion Implantation Equipment
    • 400 Components, Parts & Accessories
  • Piezo Electronic Components
    • 401 Sub-systems
  • Plasma Sources; Controls; Monitoring; Diagnosis
  • Power Supplies; RF Generators; Converters; Electrical Cond.
  • Temp. Sensing; Control; Recirculators; Chillers; Heat Exch.

    • Send Email

    Type your information and click "Send Email" to send an email to this exhibitor. To return to the previous screen without saving, click "Reset".

    Loading ...

    :
    :


    Legend
    Available Timeslot
    Scheduled Appointment
    Personal Appointments
    Appointment Request
    Blocked Timeslot
    Restricted Timeslot
    Cancelled
    Declined