Ushio, Inc.

  • Booth: 548

For litho, surface treatment, or heating, visit USHIO now!

Overview

Established in 1964, USHIO INC. (TOKYO: 6925) is a leading manufacturer of light sources such as lamps, lasers, and LEDs, in a broad range from ultraviolet to visible to infrared rays, as well as optical equipment that incorporate these light sources. 

USHIO exhibits the following products:

  • UX-series photolithography systems
  • Excimer 172nm UV surface treatment systems
  • Halogen lamps for heating process of semiconductor
  • Flash lamp annealing equipment
  • LED annealing equipment


  Press Releases

  • ―Improved resolution and overlay accuracy achieved while maintaining the previous projection area―

    Ushio Inc. (Head office: Tokyo, President and CEO: Koji Naito; hereinafter “Ushio”) hereby announces that it will start selling the UX-58112SC in June 2023, which achieved the world-class high resolution of L/S=3μm, as a large-field stepper for cutting-edge package substrates and substantially improved the overlay accuracy.

    This product had been awarded “JPCA Show AWARDS 2023*1” at JPCA Show 2023  held from May 31 to June 2 at Tokyo Big Sight. During the event, it  had been presented by “Monozukuri Taro,” a YouTuber viewing manufacturing jobs and technologies, on stage at East 2 Hall 2C-06.

    The UX-58112SC is the newest model of the large field stepper UX-5 series for cutting-edge IC package substrates with a worldwide market share of 90%*2, which is used for the exposure of package substrates for semiconductors installed in a variety of devices such as PCs, smartphones, and tablets.

    The semiconductor market has made remarkable development in accordance with Moore’s law that the number of transistors in an integrated circuit (IC) “doubles about every two years.” The miniaturization of transistors was approaching its limit in the 2010s, but the market has continued to expand thanks to the progress of packaging technology and the development of other new technologies such as a chiplet technology in recent years. As a result, the demand for miniaturization for package substrates has been accelerating so the improvement of resolution and overlay accuracy has become essential for lithography equipment.

    Therefore, Ushio has successfully developed the UX-58112SC, which achieved the world-class high resolution of L/S=3μm as a large field stepper for IC package substrates and substantially improved the overlay accuracy, while maintaining the previous 250x250mm exposure field size and footprint, by using its expertise and experience accumulated in the IC package substrate industry over many years together with customers combined with its unique optical design technology developed since its foundation.

    The UX-58112SC enables achieving higher productivity and yield than before by improving the resolution and overlay accuracy while maintaining the previous high throughput, with an eye on the multi-layered and larger packages of the next-generation package substrates which are essential for the progress of IoT, 5G, and mobility.

    As a leading company of large field steppers for cutting-edge IC package substrates, Ushio will contribute to the creation of a convenient and comfortable society with light.

    *1 The award is presented to exhibitors who showcased outstanding products and/or technologies, and awardees are determined based on the following criteria:  (1) creativity (uniqueness/originality), (2) potential for further development and future in the industrial world, (3) reliability, (4) adaptability to the times, and (5) form of expression (appropriate expression, concise and clear description at the time of application.

    * Ushio’s data as of March 31, 2023.

    Main Features

    • Achieved the world-class high resolution of L/S=3μm as a large field stepper and substantially improved the overlay accuracy
    • Light source and other components are instrumented by Ushio’s proprietary design.
    • Improved the resolution and overlay accuracy while maintaining the previous exposure field size and throughput

    Specifications

    UX-58112SC UX-5894SC (previous model)
    Exposure field size 250x250mm
    Substrate size SEMI Standards 510x515mm
    Resolution 3μm L/S 5μm L/S
    Throughput 30 seconds/panel
    Exposure wavelength i-line

    * Appearance and specifications are subject to change without prior notice

  • ・Strategic partnership to accelerate industry’s transition to heterogeneous chiplet integration on glass and other large substrates
    ・Partnership combines Applied’s leadership in large panel processing with Ushio’s leadership in lithography for packaging
    ・New digital lithography technology to enable world’s leading chipmakers to combine chips with sub-micron wiring



    TOKYO and SANTA CLARA, Calif., Dec. 12, 2023 – Ushio Inc. and Applied Materials, Inc. today announced a strategic partnership to accelerate the industry’s roadmap for heterogeneous integration (HI) of chiplets into 3D packages. The companies are jointly bringing to market the first digital lithography system specifically designed for patterning the advanced substrates needed in the Artificial Intelligence (AI) era of computing.

    Rapidly growing AI workloads are driving the need for larger chips with greater functionality. As the performance requirements of AI outpaces traditional Moore’s Law scaling, chipmakers are increasingly adopting HI techniques that combine multiple chiplets in an advanced package to deliver similar or higher performance and bandwidth as a monolithic chip. The industry needs larger package substrates based on new materials such as glass that enable extremely fine-pitch interconnects and superior electrical and mechanical properties. The strategic partnership with Applied brings together two industry leaders to accelerate this transition.

    “Applied’s new Digital Lithography Technology (DLT) is the first patterning system that directly addresses the needs of our customers’ advanced substrate roadmaps,” said Dr. Sundar Ramamurthy, Group Vice President and General Manager of HI, ICAPS and Epitaxy, Semiconductor Products Group at Applied Materials. “We are leveraging our unmatched expertise in large substrate processing, the industry’s broadest portfolio of HI technologies, and deep R&D resources to enable a new generation of innovation in high-performance computing.”

    “Ushio brings over 20 years of experience building lithography systems for packaging applications, with more than four thousand tools delivered worldwide,” said William F. Mackenzie, Group Executive Officer and General Manager, Photonics Solutions Global Business Unit at Ushio. “With this new partnership, we can accelerate adoption of DLT through our scalable manufacturing ecosystem and robust field-service infrastructure, and broaden our portfolio to provide more solutions to the rapidly evolving challenges in packaging technology.”

    The new DLT system is the only lithography technology that can achieve the resolution necessary for advanced substrate applications while delivering throughput levels required for high-volume production. With the ability to pattern less than 2-micron line widths, the system enables the highest area density for chiplet architectures on any substrate, including wafers or large panels made of glass or organic materials. The DLT system is uniquely designed to solve unpredictable substrate warpage issues and achieve overlay accuracy. Production systems have already been shipped to multiple customers, and 2-micron patterning has been demonstrated on glass and other advanced package substrates.

    Applied pioneered the technology behind the DLT system and will be responsible for R&D and definition of a scalable roadmap together with Ushio to enable continued innovation in advanced packaging to 1-micron line widths and beyond. Ushio will leverage its mature manufacturing and customer-facing infrastructure to accelerate adoption of DLT. Together, the partnership offers customers the broadest portfolio of lithography solutions for advanced packaging applications.

  Products

  • Excimer
    We offer a broad range of lineups; for laboratory use to mass production level with the world's highest performance!...

  • Ushio's excimer is well known for outstanding productivity with the world's highest illuminance and highest exposure.
    Since becoming the world’s first supplier in 1993, we have been supporting many customers as a top manufacturer of excimer lamps.

    What Is Excimer?
    1. Suitable for various applications; Dry cleaning, improving hydrophilicity (wettability), improving adhesion, ashing/residue removal, etc.

    2. High photon energy (7.2 eV); It can quickly generate highly reactive oxygen atoms(O3p、O1D) and various radicals.

    3. Low-temperature processing; Because no mercury is used, lamps run cool and emit few wavelengths that increase temperature.


    4. Instantaneous ignition; CoO is improved by lighting only when required for processing.

    What Is Ushio's Excimer?
    Diverse line-up; Achieves the industry's highest illuminance, highest exposure, and longest-life lamps.
    From labatory size to mass production use which lamp size is up to 3 meters long.

  • Flash Lamp Annealer
    Ultra short time annealing process...

  • In, 1975, Ushio developed the world's first flash lamp for compact camera’s built-in strobe lamp.

    Since then, we have been contributing to the growing semiconductor market by developing applications in the semiconductor heating field

    About Flash Lamp Annealer

    1.A machine to anneal a work piece within 1 millisecond by irradiating on a target.

    2. Does not generate particles in irradiation process, since it’s implemented by remote process.

    3. Has a potential to heat various targets by having broad emission spectrum (UV to Infrared)

    Features of Ushio's Flash Lamp Annealer

    1. Irradiates the target with high power and wide irradiation area

    2. High controllability in target's depth of heating

  • Lithography Stepper/Aligner
    Ushio offers both wafer-level projection aligner and panel-level stepper using our unique large-field projection lens, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch or 250x250mm....

  • UX-5 Series

    Large Field Stepper

    Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio’s proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

    UX-4 Series

    Full Field Projection Aligner

    This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.


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