Yamato Scientific America

The first and only analyzer for accurate thermal resistance data of semiconductor packaging substrates in real workload.

• Evaluates thermal characteristics (thermal resistance) of power device substrates
• Evaluates heat dissipation characteristics due to module structure
• Measures and evaluates heat dissipation characteristics of individual substrate materials
• Standard equipped with analysis system software
• Device configuration: TE100 Main Control Unit and Measurement Unit, CFA302 Chiller, TEG Chip
• Conforms with ISO 4825-1:2023

DP43C is a 91L vacuum oven ideal for drying large volumes of samples in a vacuum environment. Loaded with Yamato's signature diagnostic safety features and PID controller, the DP Series is one of the most popular vacuum ovens in the market.  It is equipped with a large observation window with protective cover for increased safety and built-in storage cabinet to reduce noise from vacuum. 

Performance and functions​

• Interactive key input of the control panel for easy operation
• Equipped with high precision functions such as fixed temperature, quick auto stop, auto stop, auto start and program operations for enhanced performance
• Vacuum reaching time significantly reduced by improvement of the exhaust system, resulting in more efficient operation
• Vacuum pump can be stored in the bottom cabinet, which is suitable for space limited laboratories
• Easy removal of piping and maintenance of the vacuum pump
• Calibration off-set function

High precision smart film thickness meter with a simple and intuitive interface even beginners can easily operate. 

• Portable: light at 1.1 kg and easy to carry
• High precision and easy measurement: Measurements down to the thinnest 1 μm are possible without the need for a calibration curve.
• Non-destructive/non-contact measurement: Measures without damaging the sample.
• Measure various samples: Measurement is possible regardless of the base material (glass or plastic).
• Measurement results: Uses a simple interface, making it easy to set conditions. In addition, the absolute value of the film thickness is displayed. Also possible to keep the necessary measurement.

Film thickness measurement principle: Reflection spectroscopy (optical interferometry)

SM-100S measures film thickness using a method called reflection spectroscopy (optical interferometry). For example, when measuring a film coated on a substrate, light incident from above the target sample is reflected by the film surface. Furthermore, the light that passes through the film is reflected at the substrate and film interface. The optical interference phenomenon caused by the phase shift (phase difference) due to the optical path difference at this time is measured, and the film thickness can be determined from the obtained reflection spectrum and refractive index.