As process geometries within the semiconductor industry continue to shrink to 3nm and beyond, the need for highly accurate, responsive and repeatable gas flow control during wafer processing is essential. With the emergence of low gas flow rates, short processing times and continuous plasma processing, best-in-class MFCs are struggling to meet the accuracy, settling time and repeatability requirements demanded to ensure high yield and matched chambers.
Pivotal Systems’ GFC paves the way for the future of gas flow control. The GFC combines Pivotal's patented, high accuracy GFM™ system with patented control valve technology. As such, it leapfrogs the current MFC technology by offering an order of magnitude improvement on key flow metrics, thereby enabling advanced wafer-manufacturing processes.
Feature Description:
Wide Flow Range:Full Scale 0.5−100%
Best Flow Accuracy: ±0.5% of Setpoint for 0.5−100% Full Scale
Fastest Settling Time for Turn-On and Turndown: ≦ 100ms:10% -100% Full Scale; ≦ 300ms:0.5% -10% Full Scale
Effect of Pressure and Temperature: Invariant
Automated In Situ Calibration: NIST Traceable
Innovative Control Technology:Robust Design, No Orifice