Dynamic and static map systems copyrighted and patented by Eoulu
Make the machine faster and more accurate
Eoulu’s patented “Near-Zero Error (C0)” and “Virtual Ruler (VR)” technologiesSpecialized in measuring uneven wafers
Eoulu’s patented “Near-Zero Error (C0)” and “Virtual Ruler (VR)” technologies
Specialized in measuring uneven wafers
The F1 architecture completely solves the current uncertainty
of probe insertion on the machine in the market.
It is a model that all peers will surely follow.