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Optoprofiler LLC

SUNRISE,  FL 
United States
http://www.optoprofiler.com
  • Booth: 164

Optoprofiler LLC optical metrology for semi industry

Overview

Optoprofiler LLC 

Company Info

Optoprofiler LLC is a Florida-based company developing and manufacturing mapping metrology systems for thin wafer thickness, topography, and stress metrology for semiconductor, optoelectronics MEMs, and chemical industries. In addition to automated wafer mapping systems, we manufacture specialized spectroscopic, position, and internal structure monitoring sensors for precision manufacturing and defense industries. The company is entirely US-based and employs US citizens. Optoprofiler LLC is also representing various companies addressing optical metrology market. 

Our products 

List of products include:

  • Optoprofiler*)
  • NIR (near infrared) spectrometer*)
  • Calibrated Camera
  • Nanoradian Probe*)
  • Range from De-Focus
  • Roughness from Scatterometry*)
  • Industrial End Point Detector

Optoprofiler LLC is promoting its own products and is representing in US following companies: 

EVATRONICS SA - Optoprofiler LLC represents Evixscan product line, Chimpetrics in US, and Optoprofiler LLC is an exclusive representative of FSM End Point Detection product line in US


  Press Releases

  • Finnish 3D metrology specialist to feature in Optoprofiler’s booth 164 in San Francisco’s Moscone Center

    Joensuu, Finland/San Francisco, USA – July 1st, 2024 – Chipmetrics Oy, an innovative metrology solutions provider to the semiconductor industry, announces its participation at SEMICON West 2024 in cooperation with distributor Optoprofiler. In Optoprofiler’s booth 164, visitors are invited to view the latest developments in 3D metrology solutions, such as the Chipmetrics PillarHall test chips.

    “We are excited to showcase the PillarHall test device and our expanded metrology wafer family to SEMICON West attendees,” says Jenni Backholm, Head of U.S. Business Development at Chipmetrics. “Our goal is to help speed up development of next-gen chips and provide engineers with quick, accurate data needed for effective process iteration. Visit us at Optoprofiler’s booth to learn more about how you can improve your monitoring accuracy in a very cost-efficient way.”

    With the semiconductor industry increasingly moving toward advanced packaging and 3D stacking, quicker ways to qualify film deposition processes means a competitive advantage on the market. To this end, Chipmetrics provides a full range of metrology products which allows for near instantaneous and non-destructive analysis of ALD (Atomic Layer Deposition) and CVD (Chemical Vapor Deposition) processes outputting accurate data.

    “Accurate data in itself is crucial to success in developing new processes,” says Mikko Utriainen, CEO at Chipmetrics. “This is already true with traditional workflows, but with the semiconductor industry increasingly leaning on AI tools we should also remember that any AI is only as good as the data it has to work with.”

    SEMICON West takes place in San Francisco’s Moscone Center, July 9–11. The 2023 edition of the show attracted over 10,000 attendees from 41 countries with 85% of visitors being linked to the semiconductor industry.

    About Chipmetrics
    Chipmetrics Oy develops and delivers metrology solutions for manufacturing processes for the semiconductor industry, focusing on innovative metrology chips and ALD measurement services. Its main product is the PillarHall® metrology chip for near-instantaneous thin film process conformality measurement. Founded in 2019, its head office is in Joensuu, Finland, with employees and sales partners in Japan, South Korea, USA, and Germany.

    For more information, visit www.chipmetrics.com.

    Press contact:
    Jonas Klar
    Chipmetrics Oy
    [email protected]
    [email protected]

    Editor’s note on ALD:
    Atomic Layer Deposition (ALD) is a precision thin-film deposition technique crucial for semiconductor manufacturing, enabling the production of uniform and conformal layers essential for microelectronic devices. Through alternating exposure to precursor gases that react with the substrate in a self-limiting manner, ALD achieves atomic-level control over film thickness and composition. This method ensures exceptional uniformity across complex geometries, vital for the miniaturized, multi-layered structures such as the future’s 3D chips in advanced semiconductor devices, keeping Moore’s Law alive.

    Finland plays a key role in the ALD landscape, having pioneered the process in the 1970s. Finland's contribution to ALD includes significant advancements in materials science, equipment design, and the exploration of new applications ranging from electronics to renewable energy sectors. The country's strong emphasis on research and development in nanotechnology has positioned it as a hub for ALD innovation, fostering collaborations between academia, industry, and research organizations worldwide.


  Products

  • NIR Spectrometers
    This is a high performance visible NIR spectrometer with optional external triggering. This spectrometer has the same standardized software as our visible spectrometer but NIR optics and InGaAs detector. . ...

  • We offer a novel cost-effective high spectral resolution and small bandwidth spectrometers for the fiber optic frequency domain optical coherence tomography (FD-OCT) for thin wafer semiconductor applications. The spectrometers employ achromatic dispersive optics. We also present a novel method for calibration of this narrow bandwidth spectrometer using a fiber optic Michelson interferometer.

    We offer frequency domain optical coherence tomography FD-OCT systems for semiconductor wafer metrology. The main semiconductor applications in which FD-OCT systems were applied include:
    • Wafer thickness applications 
    • Thickness of various layers in the multilayer samples, and wafers on grinding and dicing tapes
    • Stress measurement in semiconductor structures
    • Various MEMS structures metrology
     
  • PillarHall LHAR4 silicon test chip
    PillarHall LHAR4 silicon test chip contains Lateral High Aspect Ratio test structures for ALD and CVD thin film characterization. It is used as a measurement tool for thin film conformality and thin film side wall properties in a deep trench....

  • PillarHall LHAR4 silicon test chip contains Lateral High Aspect Ratio (>1000) test structures for ALD and CVD thin film characterization. It is used as a measurement tool for thin film conformality, thin film side wall properties in a deep trench for quality control and assurance as well as during process development and wafer level conformality analysis. 
    PillarHall’s innovative approach reduces measurement costs by eliminating the need for destructive sample preparation, special analytical tools, specialist users, and special expensive services. Conformality is challenging to measure and quantify since standardized measurement methods do not exist. Traditional vertical test structures typically rely on tedious and time-consuming cross-sectional SEM/TEM analyses. The lateral 3D approach of PillarHall® enables fast, easy, and accurate measurement without cross-sectioning and destructive sampling.  
  • Optoprofiler 200 wafer scanner
    Optoprofiler 200 mm is a new tool for front-end and backend (backgrind). System measures wafer topography, thickness, and layer thickness for wafers and MEMs structures mounted on carriers and tapes....

  • Optoprofiler 200 is capable of measuring wafers up to 200 mm. Measured parameters include: 

    1. Wafer thickness

    2. Wafer topography

    3. Bow and Warp

    4. Internal layers (from wafers wafers transmitting NIR)

    Tool is particullarly useful for wafers mounted on tapes and carriers. 

    In addition ot complete system we may provide OEM probe which can be iontegrate into customer tool. 

    We would like to invite interested parties including: prospective customers, representatives, distributors, manufacturing and marketing and distribution companies industrial artists to improve graphical materials :-) to submit their proposals and/or samples for tool evaluation, and to arrange a beta demonstration of the tool. Interested parties are welcome to contact us at [email protected] or call us at 1 267 626 3075. More information on our company can be found on our web site optoprofiler.com.


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