ECM Greentech semiconductor wafer processing furnaces are ideal for diffusion, oxidation, doping, LPCVD, PECVD, direct plasma, low RF, and other processes in wafer and cell manufacturing (Up to 300mm wafers). R&D/Lab to mass production.
DF-SERIES
Mass production | Up to 300mm wafers
- Batch-type production furnace
- Up to 4 independent tubes
- 50-400 wafers per tube
- Diffusion, LPCVD, Oxidation
TUBESTAR
R&D/Small production horizontal furnace | Up to 300mm wafers
- Batch-type tube furnace
- 1-4 independent tubes
- Up to 100 wafers per tube
- Diffusion, LPCVD, Oxidation
MEMSLAB
R&D/Small production PECVD platform | Up to 300mm wafers
- Batch-type PECVD furnace
- Up to 25 wafers per batch
- Direct Plasma, Low RF