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SAMCO Inc.

Santa Clara,  CA 
United States
http://www.samcointl.com
  • Booth: 1732

We look forward to meeting with you at the Samco booth.

Overview

SAMCO Inc. is a process equipment company that develops and manufactures a wide variety of unique deposition (PECVD and ALD), etching (ICP, RIE and DRIE), and surface treatment systems (Plasma cleaners, UV-Ozone Cleaners and Aqua Plasma systems) for a worldwide network of major industrial customers and academic facilities. We provide process expertise and turnkey systems to major manufacturers in the compound semiconductor, telecommunication, sensor, photonics, MEMS, bio-medical and other industries.  With offices gloabally, Samco provides world-class support to our installed base customers.


  Press Releases

  • Samco has reached the milestone of 500 shipments of its widely used RIE-10NR capacitively coupled plasma (CCP) type reactive-ion etching (RIE) R&D system.

    Michihisa Yamamoto, team Leader of the Quantum Electron Device Research Team at RIKEN Centre for Emergent Matter Science, supervised the installation of the 500th RIE-10NR and received a visit from Samco president and COO, Tsukasa Kawabe.

    The Quantum Electron Device Research Team at RIKEN has harnessed the capabilities of the RIE-10NR for the selective etching of two-dimensional material devices. During the commemorative meeting, Yamamoto shared the following remarks:

    "We utilise the RIE-10NR to etch hexagonal boron nitride (hBN), an insulating material, which has been sandwiched around graphene, in order to facilitate graphene contact extraction. The RIE-10NR was our preferred choice due to its ability to perform selective etching and deliver superb repeatability. Notably, I previously utilized an older RIE-10NR model, dating back to 1998, during my tenure at the University of Tokyo. Surprisingly, even today, other professors at the University of Tokyo continue to rely on it. Its remarkable reliability has earned my unwavering trust over the years."

  • Japanese semiconductor equipment company Samco has embarked on a partnership with Eastern Switzerland University of Applied Sciences (OST).

    This move aims to expand overseas sales, and bolster the development of the European market.

    Samco will lend its best-selling RIE-10NR parallel plate RIE system and UV-2 tabletop ozone cleaner for research and development purposes to OST’s Institute for Microtechnology and Photonics (IMP). This collaboration provides a gateway to advanced research and development with access to OST's 600m² ISO 5-7 cleanroom facilities and equipment.

    The two systems, RIE-10NR and UV-2, were placed at Samco-Ucp, Samco's European subsidiary in Liechtenstein, in April 2021. The IMP cleanroom at OST is a 10-minute drive from Samco-Ucp. It's fully equipped with pre- and post-etching process equipment; such as a resist coater, and measurement instruments including a scanning electron microscope (SEM) and a film thickness meter for evaluating etching performance.

    Vinzenz Gangl, Samco-Ucp's new CEO said: “We are delighted to have fostered a strong and fruitful partnership with OST, making this incredible opportunity a reality. The University offers fully-equipped clean room facilities and exceptional infrastructure, simplifying the process of sampling and research and development. We eagerly anticipate a bright and prosperous future in collaboration with OST”.

  • Samco reveals plans to install plasma etching system RIE-10NR early 2024 as the newest update to the Materials Research Lab (MRL) at the University of Illinois Urbana-Champaign (UIUC).

    At the forefront of materials science research, the lab will implement RIE-10NR, a fully automatic reactive ion etching system capable of high-performance processing in a compact space. Known as a staple piece of equipment, the RIE-10NR has more than 30 years of continuous improvement since its initial launch, and 500 systems installed worldwide as of July 2023.

    Director of Research Facilities at University of Illinois Urbana-Champaign's MRL, Dr. Mauro Sardela commented "Samco ... [was] very proactive in contacting our lab, visiting us and showcasing their product. [The company was] very flexible in finding the best product to fit our research needs and our current budget." He also shared the future plans of the lab, stating that "We are hoping to upgrade our RIE capabilities to better support our base of more than 1,000 users. We hope to provide state-of-the-art etching uniformity in our test devices, combined to easy-to-use interface for our various students." Overall, he wished "[Samco continues] to serve the microelectronics market with state-of-the-art etching and coating tools."

    Tsukasa Kawabe, President and COO of Samco, stated "In the semiconductor manufacturing world, numerous prominent names and corporations exist, but far less willing to work to suit each and every need of a client. Here at Samco, we specialize in making systems like the RIE-10NR, which has an exceptionally small footprint, is cost-effective, boasts exceptional reliability, and benefits from more than three decades of continuous improvements. We are always looking for ways to add value to both the world and for our clients. We are confident MRL at UIUC will be satisfied with the RIE-10NR system."


  Products

  • Reactive Ion Etching System RIE-10NR
    The RIE-10NR is a versatile low-cost, high-performance, fully automatic reactive ion etching system which meets the most demanding process requirements for non-corrosive gas chemistry. ...

  • The RIE-10NR is a versatile low-cost, high-performance, fully automatic reactive ion etching system
    which meets the most demanding process requirements for non-corrosive gas chemistry.
    A computerized touch screen provides a user-friendly interface for process recipe programming and storage.
    The system enables accurate sidewall profile control and high etch selectivity between materials.
    With its sleek, compact design, the RIE-10NR requires minimal clean room space.
  • PECVD system PD-220NL
    The PD-220NL is a load-lock PECVD (Plasma Enhanced Chemical Vapor Deposition) system capable of depositing silicon-based films such as SiO , SiN, SiON and amorphous Si....

  • The PD-220NL is a load-lock PECVD (Plasma Enhanced Chemical Vapor Deposition) system
    capable of depositing silicon-based films such as SiO , SiN, SiON and amorphous Si.

    This system offers all of the standard features for PECVD in a very small footprint. Films with
    superior thickness, uniformity and stress control can be deposited over a 220 mm diameter
    area with excellent stability and repeatability.
    A computerized touch panel provides a user-friendly interface for parameter control and
    recipe storage.

  • Deep Reactive Ion Etching (DRIE) system, RIE-400iP
    The RIE-400iPB is a dedicated silicon ething system specifically designed for the Bosch Process, which is required for MEMS and TSV applications. ...

  • The RIE-400iPB is a dedicated silicon ething system specifically designed for the Bosch
    Process, which is required for MEMS and TSV applications.
    The system’s unique reaction chamber, electrode, stage and vacuum design overcomes
    the problems encountered by competing systems to allow high-rate, high-aspect,
    tilt-free etching with good selectivity.
    This system is also capable of high speed SiO etching by replacing the ICP source.

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