Precision Power to Improve Plasma Control for Etching
Overview
EHT Semi produces precision pulsed power systems for improving plasma control for semiconductor processes. Our power systems enable manufacturers to move beyond RF generators and drive wafer bias with optimized waveforms. The optimized waveforms allow for precision control of the ion energy distribution (IED) to map out arbitrary IEDs at the wafer surface. This enhanced control can increase the etching rate, improve the minimum critical dimension, and operate at higher efficiency.