Shanghai Jheat Technology Co., Ltd.

上海市,  上海市 
China
http://www.jieretech.com
  • Booth: 2051

Welcome to visit SHANGHAI JHEAT TECHNOLOGY CO., LTD. eBooth!

Overview

SHANGHAI JHEAT TECHNOLOGY CO., LTD.(hereinafter referred to as “the Company”) is a high-tech enterprise that specializes in ultra-high precision temperature measurement and control products, headquartered in Shanghai, and set up branches and production bases in Wuxi, Nantong and other places.
The Company closely follows the international advanced technology level, and the temperature measurement and control accuracy is up to the μK level. The Company has implemented production, and products are verified by customers. The main product categories include high-precision temperature sensors, high-precision temperature measurement and control instruments, temperature measurement systems in the semiconductor field and low-temperature systems in the quantum field.
The Company’s technical team has more than 20 years of experience in temperature measurement and control industry, with products applying temperature measurement and control technology in semiconductor, quantum, metrology and other industries, serving for high-level enterprises such as authoritative metrology institutions, chip manufacturing companies, and major research institutes.


  Products

  • RTD-Wafer Temperature Measurement System
    RTD-Wafer temperature measurement system provides high precision, in-situ hot plate temperature measurement and supports processes such as photoresist tracking systems and wafer detectors....

  • RTD-Wafer Temperature  Measurement System

    Overview

    RTD-Wafer temperature measurement system provides high precision, in-situ hot plate temperature  measurement and supports processes such as photoresist tracking systems and wafer detectors.  The system directly measures wafer temperature stability and uniformity without relying on contact  temperature sensors. With this system, lithography engineers can measure and fine-tune the photoresist  baking temperature uniformity to ensure that the advanced lithography process meets the temperature  accuracy required to achieve high yields.

    Features

    a.High precision, fast acquisition speed that can be up to 8Hz; 

    b.Above the wafer is less than 2mm;  

    c.Dependable stability,sensor with less risks  of neither falling off nor breaking  the line.

  • TC Wafer Collector
    The TC-Wafer Temperature Measuring System is designed to collect temperature data from the environment of process equipment. The system comprises the TC-Wafer unit and computer testing software....

  • TC-Wafer Temperature  Measuring System

    Overview

    The TC-Wafer Temperature Measuring System is designed to collect temperature data from the environment of process equipment. The system comprises the TC-Wafer unit and computer testing software. It features channels ranging from 1 to 34, capable of measuring a broad spectrum of temperatures. The system ensures real-time transmission of collected data, communicating with the computer via wired modes such as RS485, USB, or Ethernet. It also includes functions for data collection, storage, analysis, curve drawing, and cloud mapping.

    Features

    a.The collection channels range from 1 to 34; 

    b.The temperature measurement range is wide, from 0℃ to 1100℃ ;

    c.Diverse communication methods,  such as RS485, USB, or Ethernet;

    d.For further analysis of temperature  data, curves and cloud maps  can be drawn.

  • In-situ Scanner Temp System
    In-situ Scanner Temp System supports monitoring of dry, immersion and EUV lithography scanners....

  • In-situ Scanner Temp System

    Overview 

    In-situ Scanner Temp System supports monitoring of dry, immersion and EUV lithography scanners.  In-situ Scanner Temp System produces high accuracy temporal and spatial wafer temperature data  that can assist lithography engineers monitor scanner thermal variations that affect pattern overlay  performance. With a standard-thickness(12 inches) wafer format, this system can be used to monitor  lithography thermal uniformity and stability with high precision and low noise, enabling scanner  qualification and matching.

    Features

    a.High accuracy, flexible application, fast measurement;

    b.Scanning speed up to 4Hz, temperature accuracy up to 10mK;

    c.Point-to-point wireless communication.


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