OMNI SiC™ (CVD Silicon Carbide) – With a purity level that sets it apart, our OMNI SiC™ (CVD Silicon Carbide) is ideal for use in Semiconductor manufacturing and silicon wafer processing. This material has excellent chemical resistance, outstanding machinability, high thermal conductivity, and long wear life. OMNI SiC™ is available in thicknesses ranging from less than 1mm to 15mm
Advantages of OMNI SiCTM
- Purity greater than 99.99% (less than 5 ppm total)
- Low or high resistivity
- Excellent chemical resistance
- Diameters – 500 mm
- Outstanding machinability
- High thermal conductivity
- Superior corrosion resistance
- Long wear life